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LET9045C

STMicroelectronics

LET9045C by STMicroelectronics

LET9045C by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 9 A, breakdown voltage of 80 V, and operates in the ultra-high frequency band. Its robust design supports high power dissipation up to 108 W.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,955 parts In-Stock

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3,955

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Digiode

USA . 1,757 parts In-Stock

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1,757

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Anansix

USA . 1,495 parts In-Stock

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1,495

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 2,213 parts In-Stock

1+ parts

$0.383

100+ parts

-

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$0.344

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2,213

$0.383

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$0.344

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MKK Technologies

India . 1,165 parts In-Stock

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$0.720

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1,165

$0.720

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DigiPath Technology Company

USA . 1,165 parts In-Stock

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$0.720

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1,165

$0.720

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AZTECH Wire

Italy . 215 parts In-Stock

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$17.360

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215

$17.360

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Component Stockers USA

USA . 476 parts In-Stock

1+ parts

$99.990

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476

$99.990

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Corphita

USA . 3,682 parts In-Stock

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3,682

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Parana Technologies

USA . 1,083 parts In-Stock

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$0.458

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1,083

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$0.458

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Authorized Procurement Solutions

USA . 500 parts In-Stock

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500

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Perfect Parts

USA . 17 parts In-Stock

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Overview

Unlock the power of performance with the LET9045C from STMicroelectronics, a leader in innovative semiconductor solutions. This robust RF Power FET excels in high-frequency applications, delivering unmatched efficiency and reliability for amplifiers in diverse systems. With its advanced technology and superior thermal management, you can count on exceptional quality that translates to longer lifespan and reduced downtime. Elevate your designs today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This durable packaging material provides excellent protection and thermal stability, making the product reliable in various environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer better electron mobility for higher performance in switching applications, enhancing efficiency.

Configuration: SINGLE

A single configuration reduces complexity in circuit design, making it easier to integrate into various applications.

Transistor Application: AMPLIFIER

Designed for amplification, it's an ideal choice for audio and RF applications requiring signal enhancement.

Surface Mount: YES

Surface mount technology allows for compact designs and automated assembly, lowering production costs.

Minimum DS Breakdown Voltage: 80 V

With a robust breakdown voltage, this transistor can handle high voltages in demanding applications.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient use of circuit board space, optimizing layout design.

Terminal Form: FLAT

Flat terminals facilitate easier soldering and connection in PCB assembly, enhancing reliability.

Operating Mode: ENHANCEMENT MODE

In enhancement mode, this FET can be used effectively in applications where a negligible leakage current is desired, enhancing efficiency.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Suitable for UHF applications, it can be employed in communication devices and RF equipment for superior performance.

Maximum Drain Current (Abs) (ID): 9 A

This high current rating is ideal for applications that require significant power handling, making it versatile for various uses.

No. of Terminals: 2

The simple two-terminal design simplifies circuit integration and reduces potential points of failure.

Maximum Power Dissipation (Abs): 108 W

High power dissipation capability ensures reliable operation under heavy loads, making it suitable for demanding applications.

Package Style (Meter): FLANGE MOUNT

Flange mount provides additional mechanical stability and better heat dissipation, suitable for high-power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables high-speed operation and low on-resistance, resulting in efficient power management.

Maximum Operating Temperature: 200 °C

A high operating temperature rating allows for usage in extreme conditions, expanding application possibilities.

Transistor Element Material: SILICON

Silicon offers a good balance of performance, cost, and availability, making it a favorable choice for most applications.

Maximum Drain Current (ID): 9 A

Reiterating the maximum drain current, it reinforces the device's capability to handle power efficiently.

Terminal Position: DUAL

Dual terminal positioning allows for more flexible board layout designs, facilitating easier integration into systems.

Case Connection: SOURCE

Direct source connection simplifies circuit arrangement and improves overall performance in the intended application.

Technical Specifications

RF Power Field Effect Transistors (FET) LET9045C attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

80 V

Maximum Drain Current (Abs) (ID):

9 A

Maximum Drain Current (ID):

9 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDFM-F2

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

LET9045C Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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