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PD85025STR-E

STMicroelectronics

PD85025STR-E by STMicroelectronics

PD85025STR-E by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 7 A, a breakdown voltage of 40 V, and operates in the ultra-high frequency band. This compact surface-mount device ensures efficient performance with a max power dissipation of 79 W.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 6,589 parts In-Stock

1+ parts

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6,589

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Anansix

USA . 2,692 parts In-Stock

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2,692

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Digiode

USA . 1,931 parts In-Stock

1+ parts

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1,931

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,128 parts In-Stock

1+ parts

$0.979

100+ parts

-

1k+ parts

$0.881

10k+ parts

-

1,128

$0.979

-

$0.881

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MKK Technologies

India . 1,296 parts In-Stock

1+ parts

$1.841

100+ parts

-

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1,296

$1.841

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DigiPath Technology Company

USA . 1,296 parts In-Stock

1+ parts

$1.841

100+ parts

-

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10k+ parts

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1,296

$1.841

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AZTECH Wire

Italy . 739 parts In-Stock

1+ parts

$19.390

100+ parts

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739

$19.390

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Ampacity Inc.

Singapore . 429 parts In-Stock

1+ parts

$46.050

100+ parts

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429

$46.050

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Corphita

USA . 1,405 parts In-Stock

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1,405

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Perfect Parts

USA . 1,340 parts In-Stock

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1,340

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Parana Technologies

USA . 266 parts In-Stock

1+ parts

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100+ parts

$1.170

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266

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$1.170

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Overview

Unleash the power of innovation with the PD85025STR-E from STMicroelectronics, a leader in RF solutions. This exceptional N-channel FET is designed for superior amplification in ultra-high frequency applications, ensuring unmatched performance and reliability. With its robust construction and efficient design, it excels in diverse environments, offering customers unparalleled value, enhanced thermal management, and streamlined integration into cutting-edge technologies. Elevate your projects today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides excellent durability and thermal stability, making this FET suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are ideal for high-speed switching and amplifying applications due to their high electron mobility.

Configuration: SINGLE

Being a single configuration allows for compact design and easier integration into circuits.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET is suitable for audio, RF, and other signal amplification purposes.

Surface Mount: YES

Surface mount technology enhances board space efficiency and allows for automated assembly processes.

Minimum DS Breakdown Voltage: 40 V

The high breakdown voltage ensures reliable operation in high-voltage applications, enhancing safety and performance.

Package Shape: RECTANGULAR

The rectangular shape facilitates efficient board layout and optimizes space usage in electronic designs.

Terminal Form: FLAT

Flat terminals promote better contact with PCB pads, resulting in improved electrical performance.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower off-state current, making this FET more energy-efficient.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Support for ultra-high frequency enables applications in telecommunications and broadcasting, making this FET versatile.

Maximum Drain Current (Abs) (ID): 7 A

A high maximum drain current capability allows for use in demanding applications requiring robust power handling.

No. of Terminals: 2

The simple two-terminal connection makes for straightforward design and integration into various circuits.

Maximum Power Dissipation (Abs): 79 W

High power dissipation capability allows this FET to handle significant power levels without overheating.

Package Style (Meter): SMALL OUTLINE

The small outline package minimizes space on PCBs, ideal for compact electronic devices.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low noise, making it suitable for high-performance applications.

Maximum Operating Temperature: 165 °C

High operating temperature range ensures reliability in demanding environments and reduces thermal-related failures.

Transistor Element Material: SILICON

Silicon material is known for its excellent semiconductor properties, resulting in reliable performance and efficiency.

Terminal Finish: MATTE TIN

Matte tin finish provides good solderability while preventing oxidation, ensuring a reliable connection.

Maximum Drain Current (ID): 7 A

Reiteration of high current handling ensures confidence in its performance under heavy loads.

Terminal Position: DUAL

Dual terminal positions allow for flexible PCB design options and facilitate easier routing on the circuit board.

Moisture Sensitivity Level (MSL): 3

MSL 3 indicates the device has a moderate moisture sensitivity, requiring proper storage and handling to ensure reliability.

Case Connection: SOURCE

A source connection configuration simplifies circuit design and enhances performance in common amplifier setups.

Technical Specifications

RF Power Field Effect Transistors (FET) PD85025STR-E attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

7 A

Maximum Drain Current (ID):

7 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-F2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD85025STR-E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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