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PD85035C

STMicroelectronics

PD85035C by STMicroelectronics

PD85035C by STMicroelectronics is an N-channel RF power FET designed for amplifier applications, featuring a max drain current of 8 A and a breakdown voltage of 40 V. It operates in the ultra-high frequency band with a power dissipation of up to 108 W. Its ceramic, metal-sealed package ensures durability in demanding environments.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,584 parts In-Stock

1+ parts

-

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4,584

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Digiode

USA . 1,997 parts In-Stock

1+ parts

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1,997

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Anansix

USA . 700 parts In-Stock

1+ parts

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700

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 584 parts In-Stock

1+ parts

$0.709

100+ parts

-

1k+ parts

$0.638

10k+ parts

-

584

$0.709

-

$0.638

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MKK Technologies

India . 282 parts In-Stock

1+ parts

$1.334

100+ parts

-

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282

$1.334

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DigiPath Technology Company

USA . 282 parts In-Stock

1+ parts

$1.334

100+ parts

-

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282

$1.334

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AZTECH Wire

Italy . 549 parts In-Stock

1+ parts

$20.220

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549

$20.220

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Corphita

USA . 1,096 parts In-Stock

1+ parts

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1,096

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Parana Technologies

USA . 579 parts In-Stock

1+ parts

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100+ parts

$0.848

1k+ parts

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579

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$0.848

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Overview

Elevate your amplification projects with the PD85035C RF Power FET from STMicroelectronics, a leader in semiconductor technology. Crafted for performance and reliability, this N-channel transistor excels in ultra-high frequency applications, ensuring superior power handling up to 108W. Its robust ceramic-metal package guarantees durability, making it ideal for demanding environments. Invest in the PD85035C for unmatched efficiency and performance that sets your designs apart.

Feature Benefit Bullets

Package Body Material: CERAMIC, METAL-SEALED COFIRED

The ceramic and metal-sealed co-fired package provides excellent thermal and mechanical stability, making it ideal for high-performance applications.

Polarity or Channel Type: N-CHANNEL

N-Channel transistors typically offer higher efficiency and faster switching speeds, making them well-suited for RF applications.

Configuration: SINGLE

A single configuration simplifies design and integration while maintaining a compact footprint.

Transistor Application: AMPLIFIER

Designed for amplifier applications, this FET provides high gain and efficient performance for RF signal amplification.

Surface Mount: YES

Surface mount capability allows for automated assembly and contributes to reduced PCB space, enabling more compact designs.

Minimum DS Breakdown Voltage: 40 V

A minimum breakdown voltage of 40 V ensures reliable operation in high-voltage applications without risk of failure.

Package Shape: RECTANGULAR

The rectangular package shape offers a standardized footprint that facilitates easy integration into various designs.

Terminal Form: FLAT

Flat terminal form enhances soldering reliability and thermal performance, contributing to overall device reliability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation ensures that the transistor is off at zero gate voltage, simplifying control in RF applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Designed for ultra-high frequency applications, this FET meets the demands for high-speed data transmission and RF communications.

Maximum Drain Current (Abs) (ID): 8 A

With a maximum drain current of 8 A, this FET supports demanding applications requiring high power performance.

No. of Terminals: 3

The three-terminal design offers simplified connectivity while providing all necessary functions for effective operation.

Maximum Power Dissipation (Abs): 108 W

A maximum power dissipation of 108 W enables the device to handle high power loads, making it suitable for robust applications.

Package Style (Meter): FLANGE MOUNT

Flange mount style provides robust mechanical mounting options, ensuring stability in various operating environments.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology enables low power consumption and high-speed performance, making it ideal for modern RF applications.

Maximum Operating Temperature: 200 °C

A maximum operating temperature of 200 °C ensures reliable performance in high-temperature environments, enhancing operational flexibility.

Transistor Element Material: SILICON

Silicon construction provides reliable performance and mature technology benefits, including good thermal properties and established manufacturing processes.

Terminal Finish: GOLD

Gold terminal finish ensures excellent conductivity and resistance to corrosion, which enhances long-term reliability.

Maximum Drain Current (ID): 8 A

A repetition of the maximum drain current indicates consistent high-performance capacity across multiple usage scenarios.

Terminal Position: DUAL

Dual terminal position facilitates flexible circuit design and easier integration into diverse PCB layouts.

Case Connection: SOURCE

Case connection at the source ensures optimal grounding and signal integrity, enhancing the overall performance of the RF circuit.

Technical Specifications

RF Power Field Effect Transistors (FET) PD85035C attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

8 A

Maximum Drain Current (ID):

8 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-CDFM-F3

JESD-609 Code:

e4

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Package Body Material:

CERAMIC, METAL-SEALED COFIRED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

GOLD

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD85035C Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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