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PD57006TR-E

STMicroelectronics

PD57006TR-E by STMicroelectronics

PD57006TR-E by STMicroelectronics is an N-channel RF FET designed for amplifier applications. It features a max drain current of 1 A, a breakdown voltage of 65 V, and operates in the ultra-high frequency band. This surface-mount transistor excels in compact designs with high power dissipation up to 20 W.

Median Price

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Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 6,134 parts In-Stock

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6,134

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Anansix

USA . 2,206 parts In-Stock

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2,206

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Digiode

USA . 1,327 parts In-Stock

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1,327

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Cyclops Electronics Ltd

UK . 15 parts In-Stock

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15

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IDEA Electronic Components Group

UK . 778 parts In-Stock

1+ parts

$1.272

100+ parts

-

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$1.145

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778

$1.272

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$1.145

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MKK Technologies

India . 2,212 parts In-Stock

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$2.393

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2,212

$2.393

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DigiPath Technology Company

USA . 2,212 parts In-Stock

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$2.393

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2,212

$2.393

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AZTECH Wire

Italy . 476 parts In-Stock

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$10.140

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476

$10.140

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Kepictronics

USA . 9,000 parts In-Stock

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Authorized Procurement Solutions

USA . 2,000 parts In-Stock

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2,000

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Parana Technologies

USA . 1,390 parts In-Stock

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$1.521

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$1.521

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Epart123

USA . 1,200 parts In-Stock

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$22.500

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$22.500

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GreenTree Electronics

Israel . 1,200 parts In-Stock

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Corphita

USA . 1,170 parts In-Stock

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A-Z Elektronik GmbH

Germany . 770 parts In-Stock

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770

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RC Electronics

USA . 600 parts In-Stock

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600

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Perfect Parts

USA . 45 parts In-Stock

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Overview

Unlock your potential with the PD57006TR-E from STMicroelectronics, a leader in innovation and quality. This N-channel RF Power FET is designed for exceptional performance in ultra-high frequency applications, offering reliability and efficiency for amplifiers. With its robust construction and compact size, it’s perfect for modern electronics, ensuring high power dissipation and durability. Experience unmatched advantages that elevate your projects to new heights!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides a lightweight and durable casing, helping to protect the internal components while ensuring good thermal performance.

Polarity or Channel Type: N-CHANNEL

N-channel transistors generally offer better conductivity and higher efficiency for amplification applications, making them desirable for RF amplification.

Configuration: SINGLE

A single configuration simplifies design and integration into circuits, making it easier to implement in various applications.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET can enhance signal strength, making it ideal for communication and RF applications.

Surface Mount: YES

Surface mount technology allows for a compact design and facilitates automated assembly, which is essential for modern electronics.

Minimum DS Breakdown Voltage: 65 V

A minimum breakdown voltage of 65V ensures the transistor can handle substantial voltages without risk of damage, enhancing reliability.

Package Shape: RECTANGULAR

The rectangular package shape helps in efficient use of space in PCB layouts, optimizing overall design compactness.

Terminal Form: GULL WING

Gull-wing terminal form allows for easy soldering and provides reliable mechanical support, ensuring a stable connection to the PCB.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for higher efficiency and better control of current flow, which is preferable in RF applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Capability to operate in the ultra high frequency range makes this FET suitable for high-speed communication technologies.

Maximum Drain Current (Abs) (ID): 1 A

A maximum drain current of 1A ensures adequate power handling capability for various applications, allowing for versatile use.

No. of Terminals: 2

Having just two terminals simplifies circuit design and makes it easier to incorporate into existing systems.

Maximum Power Dissipation (Abs): 20 W

With a high power dissipation rating, this FET can handle significant power loads, making it reliable for demanding applications.

Package Style (Meter): SMALL OUTLINE

The small outline package style reduces board space requirements, which is beneficial for compact electronic designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for low input power requirements and high gain, which is essential for efficient RF performance.

Maximum Operating Temperature: 150 °C

A high maximum operating temperature means this FET can function reliably in harsher environments without failure.

Transistor Element Material: SILICON

Silicon as a material ensures good availability and cost-effectiveness, making it an excellent choice for mass-production.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish provides good solderability and corrosion resistance, ensuring reliable interconnections.

Maximum Drain Current (ID): 1 A

Reiterates the capability to handle 1A of drain current, reinforcing its robustness for various applications.

Terminal Position: DUAL

Dual terminal positioning enhances layout flexibility on PCBs, contributing to improved design versatility.

Moisture Sensitivity Level (MSL): 3

An MSL of 3 indicates moderate sensitivity to moisture, necessitating appropriate handling to maintain device integrity.

Case Connection: SOURCE

The source case connection enhances stability and performance, making it easier to implement in circuit designs.

Maximum Time At Peak Reflow Temperature (s): 30

A peak reflow time of 30 seconds allows for reliable soldering without risking damage to the component during assembly.

Peak Reflow Temperature °C: 250

A peak reflow temperature of 250 °C is well within the tolerance limits for a variety of soldering materials.

Technical Specifications

RF Power Field Effect Transistors (FET) PD57006TR-E attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

65 V

Maximum Drain Current (Abs) (ID):

1 A

Maximum Drain Current (ID):

1 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

250

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD57006TR-E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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