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PD57006S

STMicroelectronics

PD57006S by STMicroelectronics

PD57006S by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 1 A, a breakdown voltage of 65 V, and operates in the ultra-high frequency band. This compact device supports surface mount technology for efficient integration.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 2,453 parts In-Stock

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2,453

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Digiode

USA . 2,324 parts In-Stock

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2,324

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Anansix

USA . 1,641 parts In-Stock

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1,641

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,832 parts In-Stock

1+ parts

$1.704

100+ parts

-

1k+ parts

$1.533

10k+ parts

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1,832

$1.704

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$1.533

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MKK Technologies

India . 1,138 parts In-Stock

1+ parts

$3.204

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1,138

$3.204

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DigiPath Technology Company

USA . 1,138 parts In-Stock

1+ parts

$3.204

100+ parts

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1,138

$3.204

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AZTECH Wire

Italy . 484 parts In-Stock

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$20.980

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484

$20.980

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QUARKTWIN TECHNOLOGY LTD

USA . 27,154 parts In-Stock

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27,154

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Parana Technologies

USA . 1,845 parts In-Stock

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$2.037

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1,845

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$2.037

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Corphita

USA . 847 parts In-Stock

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847

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Overview

Elevate your RF applications with the PD57006S from STMicroelectronics, a leader in cutting-edge semiconductor solutions. This N-channel FET combines outstanding reliability and efficiency, capable of delivering high performance in ultra-high frequency environments. Its compact design and robust thermal management ensure seamless integration into amplifiers, making it the ideal choice for demanding applications. Unlock superior signal quality and experience significant energy savings, all backed by ST's commitment to innovation and excellence.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This robust material provides good protection and durability, making the product suitable for various environments.

Polarity or Channel Type: N-CHANNEL

Being an N-channel FET allows for better efficiency and higher performance in applications where faster switching and lower on-resistance are required.

Configuration: SINGLE

A single configuration minimizes complexity in circuit design and allows for easier integration into existing systems.

Transistor Application: AMPLIFIER

Designed specifically for amplification, this FET is ideal for power amplification in RF applications, enhancing signal quality.

Surface Mount: YES

The surface mount design facilitates easy installation and saves space on PCBs, leading to more compact device layouts.

Minimum DS Breakdown Voltage: 65 V

A DS breakdown voltage of 65 V ensures reliable operation in high-voltage applications, providing a good safety margin.

Package Shape: RECTANGULAR

The rectangular shape optimizes layout on PCBs and is particularly advantageous for automated assembly processes.

Terminal Form: FLAT

Flat terminals enhance soldering capabilities and provide a stable mechanical connection to the PCB.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for better performance characteristics in switching applications, contributing to overall efficiency.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Capabilities in the UHF band make this FET suitable for high-frequency RF applications, such as RF transmitters and receivers.

Maximum Drain Current (Abs) (ID): 1 A

With a maximum drain current of 1 A, this FET is capable of handling significant load currents, making it versatile for various applications.

No. of Terminals: 2

The two-terminal design simplifies connections and makes it ideal for low-complexity circuits.

Maximum Power Dissipation (Abs): 20 W

A high power dissipation rating of 20 W allows this FET to operate effectively under demanding conditions without overheating.

Package Style (Meter): SMALL OUTLINE

The small outline package style is perfect for applications where space is at a premium and contributes to overall device miniaturization.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Utilizing MOS technology enhances efficiency and performance, particularly in low-power applications.

Maximum Operating Temperature: 165 °C

A high maximum operating temperature of 165 °C ensures reliability in harsh environments and extended operational life.

Transistor Element Material: SILICON

Silicon is a widely used material that provides excellent electrical properties and is cost-effective for mass production.

Terminal Finish: TIN LEAD

Tin-lead finish improves solderability and ensures durable connections, enhancing overall product reliability.

Maximum Drain Current (ID): 1 A

With a maximum drain current of 1 A, this FET remains robust while supporting various load requirements.

Terminal Position: DUAL

Dual terminal positioning allows for flexible design and integration options within circuit layouts.

Case Connection: SOURCE

Source connection in the case design optimizes thermal management and performance in actual usage scenarios.

Technical Specifications

RF Power Field Effect Transistors (FET) PD57006S attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

65 V

Maximum Drain Current (Abs) (ID):

1 A

Maximum Drain Current (ID):

1 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-F2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD57006S Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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