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PD57006

STMicroelectronics

PD57006 by STMicroelectronics

PD57006 by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 1 A, a breakdown voltage of 65 V, and operates in the ultra-high frequency band. Its compact surface mount design ensures efficient performance in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,663 parts In-Stock

1+ parts

-

100+ parts

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10k+ parts

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4,663

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Digiode

USA . 3,579 parts In-Stock

1+ parts

-

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3,579

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Anansix

USA . 644 parts In-Stock

1+ parts

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644

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 880 parts In-Stock

1+ parts

$1.134

100+ parts

-

1k+ parts

$1.021

10k+ parts

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880

$1.134

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$1.021

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MKK Technologies

India . 2,315 parts In-Stock

1+ parts

$2.133

100+ parts

-

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2,315

$2.133

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DigiPath Technology Company

USA . 2,315 parts In-Stock

1+ parts

$2.133

100+ parts

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2,315

$2.133

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Parana Technologies

USA . 1,783 parts In-Stock

1+ parts

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100+ parts

$1.356

1k+ parts

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1,783

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$1.356

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Corphita

USA . 1,274 parts In-Stock

1+ parts

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1,274

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Overview

Unlock the potential of your next project with the PD57006 from STMicroelectronics, a leading name in innovation and quality. This N-Channel RF Power FET excels in amplifying signals at ultra-high frequencies, ensuring robust performance in demanding applications. With a compact design and impressive power handling, it provides unmatched efficiency and reliability. Choose the PD57006 for superior signal integrity and elevate your systems to new heights!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy ensures durability and resistance to environmental factors, making the product suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors generally offer lower on-resistance and higher efficiency, contributing to better performance in amplification applications.

Configuration: SINGLE

A single configuration makes this FET ideal for compact designs, allowing for easier integration into electronic circuits.

Transistor Application: AMPLIFIER

Designed for amplification, this FET enhances signal strength, which is crucial for applications requiring high fidelity.

Surface Mount: YES

Surface mount compatibility enables automated soldering processes and reduces the overall footprint on PCBs, enhancing design efficiency.

Minimum DS Breakdown Voltage: 65 V

With a breakdown voltage of 65 V, this FET can operate safely in high-voltage applications, providing reliability and performance.

Package Shape: RECTANGULAR

The rectangular package shape aids in efficient space utilization on PCBs, allowing for more compact circuit designs.

Terminal Form: GULL WING

Gull wing terminals provide excellent mechanical stability and facilitate easy soldering, enhancing assembly reliability.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for higher operational efficiency and improved signal integrity in amplification applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Capable of operating in the ultra-high frequency band, this FET is suitable for advanced communication systems and RF applications.

Maximum Drain Current (Abs) (ID): 1 A

A maximum drain current of 1 A allows the FET to handle substantial power levels, making it suitable for various amplifier designs.

No. of Terminals: 2

With only two terminals, the FET design simplifies circuit connections and reduces complexity in the overall design.

Maximum Power Dissipation (Abs): 20 W

The ability to dissipate up to 20 W of power indicates strong thermal management, enabling reliable performance in high-power scenarios.

Package Style (Meter): SMALL OUTLINE

The small outline package style contributes to space savings on printed circuit boards, allowing for more compact electronic designs.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures low power consumption and high efficiency, making this product ideal for battery-operated devices.

Maximum Operating Temperature: 165 °C

A maximum operating temperature of 165 °C provides robustness and makes this FET suitable for high-temperature environments.

Transistor Element Material: SILICON

Silicon as the transistor element material offers well-established performance characteristics, robustness, and efficiency.

Terminal Finish: TIN LEAD

Tin-lead terminal finish enhances solderability and reliability, ensuring a strong and durable connection within circuits.

Maximum Drain Current (ID): 1 A

The specification is reiterated to emphasize its capability to consistently handle significant current, optimizing functionality in demanding applications.

Terminal Position: DUAL

Dual terminal positioning provides flexibility in circuit design, thereby improving the ease of integration into different layouts.

Case Connection: SOURCE

The source connection configuration allows for effective grounding and can enhance the overall performance of the circuit.

Technical Specifications

RF Power Field Effect Transistors (FET) PD57006 attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

65 V

Maximum Drain Current (Abs) (ID):

1 A

Maximum Drain Current (ID):

1 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD57006 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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