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PD85006-E

STMicroelectronics

PD85006-E by STMicroelectronics

PD85006-E by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 2 A, a breakdown voltage of 40 V, and operates in the ultra-high frequency band. This compact surface mount device ensures efficient performance with a max power dissipation of 36.5 W.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 3,428 parts In-Stock

1+ parts

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3,428

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Anansix

USA . 2,520 parts In-Stock

1+ parts

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2,520

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Digiode

USA . 2,346 parts In-Stock

1+ parts

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2,346

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,007 parts In-Stock

1+ parts

$1.193

100+ parts

-

1k+ parts

$1.074

10k+ parts

-

1,007

$1.193

-

$1.074

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MKK Technologies

India . 1,747 parts In-Stock

1+ parts

$2.244

100+ parts

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1,747

$2.244

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DigiPath Technology Company

USA . 1,747 parts In-Stock

1+ parts

$2.244

100+ parts

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10k+ parts

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1,747

$2.244

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AZTECH Wire

Italy . 1,093 parts In-Stock

1+ parts

$14.640

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10k+ parts

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1,093

$14.640

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Ampacity Inc.

Singapore . 1,105 parts In-Stock

1+ parts

$24.050

100+ parts

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1,105

$24.050

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Corphita

USA . 3,007 parts In-Stock

1+ parts

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3,007

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Parana Technologies

USA . 2,329 parts In-Stock

1+ parts

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100+ parts

$1.427

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2,329

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$1.427

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Overview

Unlock superior performance with the PD85006-E from STMicroelectronics, a leader in semiconductor innovation. This N-channel RF Power FET excels in amplification applications, delivering robust power handling and efficiency in compact designs. Its ultra-high frequency capabilities ensure reliable operation even in demanding environments, making it a top choice for communications and industrial projects. Trust STMicroelectronics for quality that drives success!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Durable and lightweight, the plastic/epoxy material provides good thermal and electrical insulation, making it suitable for high-performance applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for better electron mobility, leading to higher efficiency and faster switching speeds, making them ideal for high-frequency applications.

Configuration: SINGLE

A single configuration simplifies design and layout, making integration into electronic systems easier and more efficient.

Transistor Application: AMPLIFIER

Designed for amplification, this FET excels in signal conditioning applications where high fidelity and gain are essential.

Surface Mount: YES

Surface mount technology facilitates efficient assembly and reduces circuit board space requirements, contributing to compact designs.

Minimum DS Breakdown Voltage: 40 V

With a DS breakdown voltage of 40V, this FET provides reliable operation in high-voltage applications, ensuring safety and performance.

Package Shape: RECTANGULAR

The rectangular shape optimizes space utilization on PCB layouts, allowing for a more organized and compact arrangement of components.

Terminal Form: GULL WING

Gull wing terminals enhance soldering reliability and ensure a strong mechanical connection to the printed circuit board.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides high input impedance and low leakage current, ideal for low-power applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Capable of operating in the ultra-high frequency range, this FET is suited for RF applications, ensuring robust signal transmission.

Maximum Drain Current (Abs) (ID): 2 A

A maximum drain current rating of 2A allows this FET to handle substantial load currents, suitable for various power applications.

No. of Terminals: 2

With only 2 terminals, this FET ensures a compact footprint while simplifying circuit design and connectivity.

Maximum Power Dissipation (Abs): 36.5 W

High power dissipation capability helps to manage heat efficiently, enhancing overall device performance and longevity.

Package Style (Meter): SMALL OUTLINE

The small outline package style contributes to a reduced surface area and lower weight, an advantage for portable and space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides excellent switching characteristics and efficiency, which are critical for modern electronic applications.

Maximum Operating Temperature: 165 °C

A high operating temperature threshold ensures reliable performance even in demanding environments, enhancing versatility in applications.

Transistor Element Material: SILICON

Silicon as the element material provides good thermal conductivity and stable performance, making it a standard choice for RF applications.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish offers excellent solderability and corrosion resistance, improving the overall reliability of the device.

Maximum Time At Peak Reflow Temperature (s): 30

The specified peak reflow time supports efficient soldering processes, ensuring reliable connections during manufacturing.

Peak Reflow Temperature °C: 250

A peak reflow temperature of 250 °C enables compatibility with modern soldering techniques, ensuring robustness in assembly.

Moisture Sensitivity Level (MSL): 3

MSL 3 indicates moderate sensitivity to moisture, allowing for appropriate handling and storage procedures without compromising performance.

Case Connection: SOURCE

Source connection allows for simpler configurations and integrates well into different circuit designs, facilitating easy implementation.

Technical Specifications

RF Power Field Effect Transistors (FET) PD85006-E attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

HIGH RELIABILITY

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

2 A

Maximum Drain Current (ID):

2 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

250

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD85006-E Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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