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LET9045TR

STMicroelectronics

LET9045TR by STMicroelectronics

LET9045TR by STMicroelectronics is an N-channel RF power FET designed for amplification in ultra-high frequency applications. It features a max drain current of 9 A, breakdown voltage of 80 V, and operates at up to 165 °C. Its compact surface mount design ensures efficient performance in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,353 parts In-Stock

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4,353

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Anansix

USA . 791 parts In-Stock

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791

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Digiode

USA . 262 parts In-Stock

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262

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,450 parts In-Stock

1+ parts

$1.002

100+ parts

-

1k+ parts

$0.902

10k+ parts

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1,450

$1.002

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$0.902

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MKK Technologies

India . 839 parts In-Stock

1+ parts

$1.884

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839

$1.884

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DigiPath Technology Company

USA . 839 parts In-Stock

1+ parts

$1.884

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839

$1.884

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AZTECH Wire

Italy . 1,160 parts In-Stock

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$14.900

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1,160

$14.900

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Ampacity Inc.

Singapore . 194 parts In-Stock

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$60.050

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194

$60.050

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Corphita

USA . 2,771 parts In-Stock

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2,771

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Parana Technologies

USA . 38 parts In-Stock

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$1.198

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38

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$1.198

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Overview

Unlock unparalleled performance with the LET9045TR from STMicroelectronics, a leader in innovative semiconductor solutions. This N-channel RF Power FET is designed for efficiency, delivering robust amplification in ultra-high frequency applications. With its compact surface mount design and exceptional power handling, it enhances system reliability while reducing footprint. Trust STMicroelectronics' legacy of quality to elevate your projects with unmatched value and performance!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material ensures durability and resistance to environmental factors, making the transistor suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors are known for their high electron mobility, resulting in better efficiency and performance in amplification applications.

Configuration: SINGLE

A single configuration simplifies design and layout, making it easier to integrate into circuits without complications.

Transistor Application: AMPLIFIER

Optimized for amplification, this transistor is ideal for boosting signal strength in various electronic applications.

Surface Mount: YES

Being surface mount compatible allows for high-density circuit designs and automated assembly processes, enhancing manufacturing efficiency.

Minimum DS Breakdown Voltage: 80 V

A breakdown voltage of 80V makes this FET suitable for high-voltage applications, ensuring reliable performance under demanding conditions.

Package Shape: RECTANGULAR

The rectangular package shape optimizes space on PCBs, allowing for efficient layout and integration into compact designs.

Terminal Form: GULL WING

Gull wing terminals provide excellent soldering characteristics, enhancing mechanical stability and ensuring reliable connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption during idle states, making it energy-efficient in applications that require signal processing.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Supporting ultra high frequency applications makes this transistor suitable for modern communication and RF applications, ensuring better performance at higher frequencies.

Maximum Drain Current (Abs) (ID): 9 A

With a maximum drain current of 9A, this FET can handle significant load currents, ideal for demanding amplifier applications.

No. of Terminals: 2

Having just two terminals simplifies connection and reduces the potential points of failure in circuit designs.

Maximum Power Dissipation (Abs): 79 W

79W maximum power dissipation indicates the ability to handle substantial energy levels without overheating, ensuring reliable operation during high-performance tasks.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space and allows for more compact board designs, making it suitable for space-constrained applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, making this transistor energy-efficient and responsive.

Maximum Operating Temperature: 165 °C

A maximum operating temperature of 165 °C allows for reliable function in high-temperature environments, enhancing thermal stability.

Transistor Element Material: SILICON

Silicon as the material ensures robustness and efficiency, making this FET a suitable choice for most electronic circuits.

Terminal Finish: MATTE TIN

Matte tin finish offers excellent solderability and resistance to corrosion, improving longevity and reliability of connections.

Terminal Position: DUAL

Dual terminal position allows for flexible and convenient placement within circuit layouts, enhancing design versatility.

Moisture Sensitivity Level (MSL): 3

MSL 3 indicates moderate sensitivity to moisture, requiring appropriate handling to ensure performance reliability during manufacturing and assembly.

Case Connection: SOURCE

Connecting the case to the source aids in thermal management and ensures grounding stability, optimizing operational efficiency.

Maximum Time At Peak Reflow Temperature (s): 30

A peak reflow time of 30 seconds ensures compatibility with standard soldering processes while preventing damage to the device during assembly.

Peak Reflow Temperature °C: 250

With a peak reflow temperature of 250 °C, this FET supports modern assembly techniques without compromising its integrity.

Technical Specifications

RF Power Field Effect Transistors (FET) LET9045TR attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

HIGH RELIABILITY

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

80 V

Maximum Drain Current (Abs) (ID):

9 A

Maximum Drain Current (ID):

9 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

3

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

250

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

LET9045TR Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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