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LET9120M

STMicroelectronics

LET9120M by STMicroelectronics

LET9120M by STMicroelectronics is an N-channel RF power FET designed for amplification in ultra-high frequency applications. It features a max drain current of 18 A, breakdown voltage of 80 V, and operates at up to 200 °C. Its compact flange mount design ensures efficient performance in demanding environments.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 3,236 parts In-Stock

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3,236

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Anansix

USA . 2,882 parts In-Stock

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2,882

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Vyrian

USA . 816 parts In-Stock

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816

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 287 parts In-Stock

1+ parts

$0.759

100+ parts

-

1k+ parts

$0.683

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287

$0.759

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$0.683

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MKK Technologies

India . 1,763 parts In-Stock

1+ parts

$1.427

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1,763

$1.427

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DigiPath Technology Company

USA . 1,763 parts In-Stock

1+ parts

$1.427

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1,763

$1.427

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Parana Technologies

USA . 1,630 parts In-Stock

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$0.908

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1,630

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$0.908

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Corphita

USA . 452 parts In-Stock

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452

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Overview

Elevate your designs with the LET9120M from STMicroelectronics, a leading name in semiconductor innovation. This N-channel RF Power FET promises outstanding performance and reliability in ultra-high frequency applications, making it ideal for amplifiers. With exceptional power handling and thermal management, it empowers your projects with efficiency and durability. Choose the LET9120M to unlock superior quality and unmatched value, ensuring your systems operate at their best.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy provides good insulation, durability, and lightweight characteristics, making it suitable for a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-channel transistors generally have higher electron mobility, leading to better performance and efficiency in amplification applications.

Configuration: SINGLE

A single configuration allows for simpler circuit designs and can save space on PCB layouts.

Transistor Application: AMPLIFIER

Designed specifically for amplification, making it ideal for applications requiring strong signal boosting.

Surface Mount: YES

Surface mount technology allows for compact assembly and increased circuit density, which is advantageous in modern electronic designs.

Minimum DS Breakdown Voltage: 80 V

An 80 V breakdown voltage makes this transistor suitable for high-voltage applications, providing reliability under various conditions.

Package Shape: RECTANGULAR

Rectangular packages are space-efficient and allow for easy integration into existing designs, facilitating better thermal management.

Terminal Form: FLAT

Flat terminals enhance surface contact during mounting, resulting in lower resistive losses and improved thermal characteristics.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides high input impedance and low ON resistance, leading to improved power efficiency.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

Ultra high frequency capabilities allow this transistor to be utilized in high-speed applications, like RF communication systems.

Maximum Drain Current (Abs) (ID): 18 A

With an 18 A maximum drain current, this transistor can handle substantial loads, making it suitable for high-power applications.

No. of Terminals: 4

Four terminals provide necessary connections for optimal operation and can support a variety of circuit configurations.

Maximum Power Dissipation (Abs): 217 W

A power dissipation capability of 217 W supports extensive power handling, allowing for effective thermal management in demanding environments.

Package Style (Meter): FLANGE MOUNT

Flange mount packaging enables easy installation and offers robust mechanical support in high-power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology leads to low gate drive power requirements and allows for fast switching speeds, improving overall efficiency.

Maximum Operating Temperature: 200 °C

A maximum operating temperature of 200 °C ensures reliable performance in high-temperature environments, increasing design flexibility.

Transistor Element Material: SILICON

Silicon as the material choice ensures good electrical characteristics and widespread compatibility with existing technologies.

Maximum Drain Current (ID): 18 A

Supporting up to 18 A drain current enhances the effectiveness of this transistor in high-current applications, ensuring durability.

Terminal Position: DUAL

Dual terminal positioning allows for symmetrical connections, which can help in balancing the electrical characteristics in circuits.

Case Connection: SOURCE

A source case connection simplifies integration into circuit designs and aids in effective thermal management.

Technical Specifications

RF Power Field Effect Transistors (FET) LET9120M attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

80 V

Maximum Drain Current (Abs) (ID):

18 A

Maximum Drain Current (ID):

18 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDFM-F4

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Form:

FLAT

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

LET9120M Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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