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NTD85N02RT4

Onsemi

NTD85N02RT4 by Onsemi

NTD85N02RT4 by Onsemi is a single N-channel power FET with built-in diode for switching applications. It features a max drain current of 85A, min DS breakdown voltage of 24V, and max pulsed drain current of 192A. This MOSFET operates in enhancement mode with a max operating temperature of 150 °C, making it suitable for high-power applications.

Median Price

$0.203

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 50,295 parts In-Stock

1+ parts

-

100+ parts

$0.211

1k+ parts

$0.175

10k+ parts

$0.156

50,295

-

$0.211

$0.175

$0.156

Verical

USA . 47,145 parts In-Stock

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$0.195

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$0.195

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Digiode

USA . 659 parts In-Stock

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$0.164

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659

$0.164

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Vyrian

USA . 6,116 parts In-Stock

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Odi Ramu Company

Canada . 2,400 parts In-Stock

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2,400

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Distributors (Availability)

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Corphita

USA . 79 parts In-Stock

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$0.156

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79

$0.156

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Corohmni

South Africa . 84 parts In-Stock

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$0.173

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84

$0.173

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AZTECH Wire

Italy . 505 parts In-Stock

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$17.430

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505

$17.430

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Continental Prestige Electronics

USA . 50,295 parts In-Stock

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$0.159

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50,295

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$0.159

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Metaverse IC Inc.

Canada . 38,652 parts In-Stock

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Kepictronics

USA . 33,000 parts In-Stock

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TANS Electronics

Latvia . 6,739 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 6,016 parts In-Stock

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Kulean Microsystems

USA . 5,426 parts In-Stock

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SupplyDigital Components

Austria . 2,325 parts In-Stock

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Problanco Electronics

Mexico . 336 parts In-Stock

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UHIMA Technologies

Türkiye . 255 parts In-Stock

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RC Electronics

USA . 200 parts In-Stock

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Overview

Enhance your power management solutions with the NTD85N02RT4 by Onsemi. Crafted with precision and expertise, Onsemi's Power Field Effect Transistor offers unmatched quality and reliability. Ideal for switching applications, this N-CHANNEL FET boasts a built-in diode and operates in enhancement mode for seamless performance. From its high pulsing capabilities to its low on-resistance, this transistor delivers exceptional value and efficiency. Trust Onsemi to provide top-tier components that meet your power needs with excellence.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection for the internal components of the transistor, ensuring a longer lifespan.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower ON-resistance and higher switching speeds, making them efficient for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and protects against reverse voltage spikes, making it convenient for switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor offers high efficiency and fast switching speeds.

Surface Mount: YES

Surface mount packaging allows for easy and compact integration onto circuit boards, saving space and improving overall PCB layout.

Minimum DS Breakdown Voltage: 24 V

With a breakdown voltage of 24 V, this FET can handle higher voltages without breakdown, making it suitable for various applications.

Maximum Power Dissipation (Abs): 78.1 W

The high power dissipation rating ensures that the transistor can handle heavy loads without overheating, providing reliable performance.

Maximum Drain-Source On Resistance: 0.0052 ohm

The low ON resistance minimizes power loss and improves efficiency in switching applications, making it an ideal choice for high-current circuits.

Maximum Operating Temperature: 150 °C

With a high operating temperature range of 150 °C, this FET can withstand higher temperatures, ensuring reliable operation in harsh environments.

Technical Specifications

Power Field Effect Transistors (FET) NTD85N02RT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

85 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

85 A

Maximum Drain-Source On Resistance:

.0052 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

192 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD85N02RT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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