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NTD80N02-001

Onsemi

NTD80N02-001 by Onsemi

NTD80N02-001 by Onsemi is a power FET with 80A max drain current, 0.0058 ohm RDS(on), and 24V min DS breakdown voltage. Ideal for switching applications, it features an N-channel configuration in a plastic/epoxy package with built-in diode. Operating in enhancement mode, it has a max power dissipation of 75W and can handle up to 200A pulsed drain current.

Median Price

$0.528

Lifecycle Status

Suppliers In-Stock

7

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 526,735 parts In-Stock

1+ parts

-

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$0.528

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$0.439

10k+ parts

$0.391

526,735

-

$0.528

$0.439

$0.391

DigiKey

USA . 526,735 parts In-Stock

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-

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$0.450

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$0.450

526,735

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-

$0.450

$0.450

Verical

USA . 526,735 parts In-Stock

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$0.548

10k+ parts

$0.489

526,735

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-

$0.548

$0.489

Distributors (In-Stock)

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Digiode

USA . 2,463 parts In-Stock

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$0.411

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$0.411

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Vyrian

USA . 1,822 parts In-Stock

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$0.433

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$0.433

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Inventory MP

USA . 206 parts In-Stock

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Bristol Electronics

USA . 206 parts In-Stock

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Distributors (Availability)

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Corphita

USA . 2,193 parts In-Stock

1+ parts

$0.390

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$0.390

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Corohmni

South Africa . 304 parts In-Stock

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$0.433

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304

$0.433

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Continental Prestige Electronics

USA . 526,735 parts In-Stock

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$0.397

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$0.397

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Kepictronics

USA . 13,000 parts In-Stock

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Kulean Microsystems

USA . 7,330 parts In-Stock

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Problanco Electronics

Mexico . 5,193 parts In-Stock

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TANS Electronics

Latvia . 3,067 parts In-Stock

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Authorized Procurement Solutions

USA . 2,500 parts In-Stock

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2,500

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SupplyDigital Components

Austria . 1,827 parts In-Stock

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UHIMA Technologies

Türkiye . 530 parts In-Stock

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530

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Overview

Experience the power of innovation with the NTD80N02-001 Power Field Effect Transistor by Onsemi. Designed for switching applications, this N-channel transistor offers a breakthrough in performance and reliability. With a maximum drain current of 80A and a low on-resistance of 0.0058 ohms, this transistor delivers unmatched efficiency and durability. Whether you're in the automotive, industrial, or consumer electronics industry, the NTD80N02-001 is the ideal choice for your power management needs. Trust Onsemi's expertise and quality to take your designs to the next level.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection to the internal components of the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have better performance and efficiency compared to P-channel FETs, making this transistor a good choice for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for improved efficiency and protection against reverse polarity, enhancing the overall functionality of the transistor.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring reliable performance in controlling power flow efficiently.

Minimum DS Breakdown Voltage: 24 V

With a high breakdown voltage, this transistor can handle higher voltages without failure, making it suitable for a wide range of power applications.

Maximum Drain Current (ID): 80 A

Capable of handling high current loads, making it suitable for power applications that require high current switching.

Maximum Power Dissipation (Abs): 75 W

The high power dissipation rating indicates the transistor's ability to handle heat, ensuring reliability and long-term performance.

Maximum Operating Temperature: 150 °C

Can operate reliably at high temperatures, making it suitable for demanding industrial applications where heat dissipation is a concern.

Maximum Drain-Source On Resistance: 0.0058 ohm

Low on-resistance leads to minimal power loss and heat generation, improving efficiency and performance in high-power applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD80N02-001 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

733 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0058 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

200 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD80N02-001 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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