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NTD80N02

Onsemi

NTD80N02 by Onsemi

NTD80N02 by Onsemi is a single N-channel power FET with built-in diode, ideal for switching applications. It features a max drain current of 80A, min DS breakdown voltage of 24V, and max pulsed drain current of 200A. With a package style of small outline and operating temperature up to 150 °C, it offers efficient performance in various electronic devices.

Median Price

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Lifecycle Status

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6

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1k+

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Vyrian

USA . 5,197 parts In-Stock

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Prism Electronics

USA . 685 parts In-Stock

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Digiode

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PC Components Company LLC

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Bristol Electronics

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NPI Materials, Inc.

USA . 25 parts In-Stock

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AZTECH Wire

Italy . 73 parts In-Stock

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Kepictronics

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Problanco Electronics

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Kulean Microsystems

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TANS Electronics

Latvia . 6,401 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,621 parts In-Stock

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Authorized Procurement Solutions

USA . 3,500 parts In-Stock

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Perfect Parts

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SupplyDigital Components

Austria . 752 parts In-Stock

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UHIMA Technologies

Türkiye . 718 parts In-Stock

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Corohmni

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Corphita

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Overview

Unleash the power of innovation with the NTD80N02 by Onsemi, a cutting-edge Power Field Effect Transistor that delivers unrivaled performance and reliability. Designed with precision and expertise, this N-CHANNEL FET with built-in diode is ideal for various switching applications. With its high-quality construction and advanced technology, this transistor offers exceptional value and benefits to customers looking for seamless operation and efficiency. Elevate your projects with the NTD80N02 and experience superior results like never before.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material ensures durability and reliability for the product.

Polarity or Channel Type: N-CHANNEL

N-channel FETs have better performance and lower resistance compared to P-channel FETs.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for more efficient switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring optimal performance in those scenarios.

Surface Mount: YES

Easy to install and suitable for modern electronic manufacturing processes.

Minimum DS Breakdown Voltage: 24 V

With a minimum breakdown voltage of 24V, it can handle higher voltage applications.

Maximum Pulsed Drain Current (IDM): 200 A

With a high maximum pulsed drain current, it can handle spikes in current without overheating.

Avalanche Energy Rating (EAS): 733 mJ

High avalanche energy rating ensures reliability under high-energy transient conditions.

Maximum Power Dissipation (Abs): 75 W

Can dissipate up to 75W of power, making it suitable for high-power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Uses MOSFET technology which offers high efficiency and fast switching speeds.

Maximum Operating Temperature: 150 °C

Capable of operating at high temperatures without compromising performance.

Maximum Drain-Source On Resistance: 0.0058 ohm

Low on-resistance ensures minimal power loss and high efficiency.

Technical Specifications

Power Field Effect Transistors (FET) NTD80N02 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

733 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

80 A

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0058 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

200 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD80N02 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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