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NTD80N02-001G

Onsemi

NTD80N02-001G by Onsemi

NTD80N02-001G by Onsemi is a Power FET with 80A max drain current, 0.0058 ohm on-resistance, and 24V min breakdown voltage. Ideal for switching applications, it features an N-channel configuration in a plastic/epoxy package with built-in diode. Operating in enhancement mode, it has a max pulsed drain current of 200A and can handle up to 733mJ avalanche energy.

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2

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1k+

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Digiode

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SupplyDigital Components

Austria . 3,037 parts In-Stock

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Kulean Microsystems

USA . 2,484 parts In-Stock

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UHIMA Technologies

Türkiye . 481 parts In-Stock

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Corphita

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Corohmni

South Africa . 330 parts In-Stock

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TANS Electronics

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Problanco Electronics

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Overview

Enhance your power systems with the NTD80N02-001G by Onsemi, a top-tier manufacturer known for superior quality and reliability. This N-channel Power FET with a built-in diode is perfect for switching applications, offering a minimum DS breakdown voltage of 24V and a maximum drain current of 80A. Its high efficiency and low on-resistance of 0.0058 ohm make it ideal for various industrial and automotive applications. Trust Onsemi to deliver cutting-edge technology that maximizes performance and ensures long-lasting functionality. Upgrade your systems today with the NTD80N02-001G and experience the difference in power management.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package body material makes the transistor lightweight and resistant to impact, making it suitable for use in a variety of applications.

Polarity or Channel Type: N-CHANNEL

N-Channel transistors typically have lower on-resistance and faster switching speeds compared to P-Channel transistors, making them ideal for high efficiency and high frequency switching applications.

Minimum DS Breakdown Voltage: 24 V

With a minimum breakdown voltage of 24V, this transistor can handle higher voltages without breakdown, ensuring reliable operation in high voltage applications.

Maximum Pulsed Drain Current (IDM): 200 A

The high pulsed drain current rating of 200A allows the transistor to handle surge currents effectively, making it suitable for power switching applications.

Avalanche Energy Rating (EAS): 733 mJ

The high avalanche energy rating of 733mJ indicates the ability of the transistor to withstand high energy spikes, providing robust protection in high voltage applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-Oxide Semiconductor technology offers high efficiency and low on-resistance, making this transistor suitable for high power applications where energy efficiency is crucial.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this transistor can withstand high temperatures, allowing for reliable operation in demanding environments.

Maximum Drain Current (ID): 80 A

The high drain current rating of 80A allows the transistor to handle large continuous currents without overheating, making it suitable for high power applications.

Maximum Drain-Source On Resistance: 0.0058 ohm

The low on-resistance of 0.0058 ohms reduces power losses and improves efficiency in power switching applications, making this transistor an excellent choice for high power applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD80N02-001G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

733 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (ID):

80 A

Maximum Drain-Source On Resistance:

.0058 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

200 A

Qualification:

Not Qualified

Surface Mount:

NO

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD80N02-001G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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