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NXH80T120L2Q0S1G

Onsemi

NXH80T120L2Q0S1G by Onsemi

NXH80T120L2Q0S1G by Onsemi is an N-CHANNEL IGBT with 1200V VCE, 57A IC, and 125W power dissipation. Ideal for POWER CONTROL applications due to its fast ton of 55ns and low VCEsat of 2.85V. Suitable for high-power systems requiring efficient switching capabilities.

Median Price

$41.740

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

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Arrow

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$41.740

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Verical

USA . 24 parts In-Stock

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$41.740

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Chip1Stop

Japan . 24 parts In-Stock

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$25.700

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Vyrian

USA . 3,819 parts In-Stock

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Digiode

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Corohmni

South Africa . 482 parts In-Stock

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Problanco Electronics

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SupplyDigital Components

Austria . 7,927 parts In-Stock

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Authorized Procurement Solutions

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Kulean Microsystems

USA . 5,175 parts In-Stock

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TANS Electronics

Latvia . 4,487 parts In-Stock

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Corphita

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UHIMA Technologies

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Overview

Enhance your power control applications with the NXH80T120L2Q0S1G Insulated Gate Bipolar Transistor (IGBT) by Onsemi. With its N-CHANNEL polarity and complex configuration, this transistor offers superior performance and reliability. Manufactured by Onsemi, known for their high-quality components, this IGBT provides a maximum VCEsat of 2.85V and a maximum Collector-Emitter Voltage of 1200V. Ideal for power control applications, this product boasts a Maximum Power Dissipation of 125W and a Nominal Turn Off Time of 320ns. Trust Onsemi's expertise and unlock the potential of your power systems with the NXH80T120L2Q0S1G IGBT.

Feature Benefit Bullets

Maximum VCEsat: 2.85 V

Low VCE saturation voltage allows for efficient power control and minimal power loss.

Nominal Turn Off Time (toff): 320 ns

Fast turn-off time ensures quick switching and precise power control.

Maximum Power Dissipation (Abs): 125 W

High power dissipation capability makes it suitable for handling heavy loads.

Maximum Collector-Emitter Voltage: 1200 V

High collector-emitter voltage rating allows for reliable operation in high voltage applications.

Maximum Collector Current (IC): 57 A

High collector current rating enables the device to handle large current loads with ease.

Technical Specifications

Insulated Gate Bipolar Transistors (IGBT) NXH80T120L2Q0S1G attributes and parameters. Explore more Insulated Gate Bipolar Transistors (IGBT) devices from Onsemi

Specs

Additional Features:

RC-IGBT

Case Connection:

ISOLATED

Maximum Collector Current (IC):

Maximum Collector-Emitter Voltage:

1200 V

Configuration:

Maximum Gate-Emitter Threshold Voltage:

6.4 V

Maximum Gate-Emitter Voltage:

20 V

JESD-30 Code:

R-XUFM-X18

No. of Elements:

4

No. of Terminals:

18

Maximum Operating Temperature:

125 Cel

Minimum Operating Temperature:

-40 Cel

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

FLANGE MOUNT

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Surface Mount:

NO

Terminal Form:

UNSPECIFIED

Terminal Position:

UPPER

Transistor Application:

POWER CONTROL

Transistor Element Material:

SILICON

Nominal Turn Off Time (toff):

320 ns

Nominal Turn On Time (ton):

55 ns

Maximum VCEsat:

2.85 V

Trade Compliance

NXH80T120L2Q0S1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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