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NTLJF3118NT1G

Onsemi

NTLJF3118NT1G by Onsemi

NTLJF3118NT1G by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a 20V DS Breakdown Voltage, 18A IDM, and 0.085 ohm RDS(ON). This small outline transistor operates in ENHANCEMENT MODE at up to 150 °C, making it ideal for various power management tasks.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 1,775 parts In-Stock

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Vyrian

USA . 1,291 parts In-Stock

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SupplyDigital Components

Austria . 8,119 parts In-Stock

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TANS Electronics

Latvia . 6,063 parts In-Stock

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Kulean Microsystems

USA . 5,329 parts In-Stock

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Problanco Electronics

Mexico . 4,783 parts In-Stock

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Corphita

USA . 1,079 parts In-Stock

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UHIMA Technologies

Türkiye . 417 parts In-Stock

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Corohmni

South Africa . 361 parts In-Stock

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Overview

Revolutionize your power management solutions with the NTLJF3118NT1G by Onsemi. As a leading manufacturer in the industry, Onsemi has engineered this high-quality Power Field Effect Transistor to provide unmatched performance and reliability. Ideal for switching applications, this N-CHANNEL transistor offers a built-in diode and operates in enhancement mode for seamless functionality. With a maximum pulsed drain current of 18 A and a low on-resistance of 0.085 ohm, this transistor delivers exceptional value and efficiency. Upgrade your electronic designs with the NTLJF3118NT1G and experience the difference today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material in the package body makes the product durable and resistant to external elements, extending its lifespan.

Minimum DS Breakdown Voltage: 20 V

The high breakdown voltage of 20 V ensures that the transistor can handle high voltage applications without getting damaged, making it reliable for various circuit designs.

Maximum Pulsed Drain Current (IDM): 18 A

With a high pulsed drain current of 18 A, this transistor can efficiently handle sudden surges in current, making it suitable for applications that require high power output.

Maximum Operating Temperature: 150 °C

The maximum operating temperature of 150 °C allows this transistor to withstand high temperatures, making it suitable for industrial or automotive applications where heat dissipation is crucial.

Maximum Drain-Source On Resistance: 0.085 ohm

Having a low drain-source on resistance of 0.085 ohms means that the transistor can switch on and off quickly with minimal power loss, making it energy-efficient and ideal for high-frequency switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTLJF3118NT1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

2.6 A

Maximum Drain-Source On Resistance:

.085 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

S-PDSO-N6

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

SQUARE

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

18 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTLJF3118NT1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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