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NTLJD3119CTAG

Onsemi

NTLJD3119CTAG by Onsemi

NTLJD3119CTAG by Onsemi is a Power FET with N-CHANNEL and P-CHANNEL configurations. It features 20V DS Breakdown Voltage, 18A Max IDM, and 0.065 ohm RDS(ON). Ideal for applications requiring high power dissipation in small outline packages.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Chip Stock

USA . 45,000 parts In-Stock

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Vyrian

USA . 7,790 parts In-Stock

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7,790

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Digiode

USA . 1,705 parts In-Stock

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1,705

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AZTECH Wire

Italy . 900 parts In-Stock

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$21.260

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900

$21.260

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Component Stockers USA

USA . 764 parts In-Stock

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$99.990

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764

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Kepictronics

USA . 40,281 parts In-Stock

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SupplyDigital Components

Austria . 5,840 parts In-Stock

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TANS Electronics

Latvia . 4,245 parts In-Stock

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A-Z Elektronik GmbH

Germany . 1,950 parts In-Stock

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Corphita

USA . 1,935 parts In-Stock

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Assy Fe

Spain . 1,000 parts In-Stock

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Problanco Electronics

Mexico . 902 parts In-Stock

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UHIMA Technologies

Türkiye . 876 parts In-Stock

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Kulean Microsystems

USA . 628 parts In-Stock

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Futuretech Components

Singapore . 507 parts In-Stock

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Authorized Procurement Solutions

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Corohmni

South Africa . 218 parts In-Stock

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Overview

Experience superior performance and reliability with the NTLJD3119CTAG Power Field Effect Transistor by Onsemi. Designed with precision and quality, this product boasts N-CHANNEL AND P-CHANNEL configuration in a separate, 2-element package with built-in diode. Ideal for a variety of applications, this transistor offers maximum power dissipation of 2.3W and operates at an enhanced mode, ensuring efficiency and durability. Trust Onsemi's expertise in semiconductor technology and elevate your projects with the exceptional value and benefits of the NTLJD3119CTAG.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Plastic/epoxy material provides good insulation and protection for the internal components of the FET, ensuring reliable performance.

Polarity or Channel Type: N-CHANNEL AND P-CHANNEL

Having both N-channel and P-channel types allows for flexibility in circuit design and compatibility with various applications.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and enhances efficiency, making this FET a convenient choice for power management applications.

Surface Mount: YES

Surface mount capability enables easy and compact integration onto circuit boards, saving space and improving assembly efficiency.

Minimum DS Breakdown Voltage: 20 V

With a minimum breakdown voltage of 20V, this FET can handle higher voltage levels, making it suitable for a wide range of power applications.

Package Shape: SQUARE

The square package shape is space-efficient and allows for easy placement on circuit boards, optimizing layout and design.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation provides fast switching speeds and low on-resistance, making this FET efficient for power control and management.

Maximum Pulsed Drain Current (IDM): 18 A

High maximum pulsed drain current allows for handling of surge currents and peak power demands, ensuring reliable performance in dynamic applications.

Maximum Drain Current (Abs) (ID): 3.8 A

The maximum drain current rating of 3.8A indicates a high current-carrying capacity, suitable for various power handling tasks.

No. of Elements: 2

Having 2 elements provides redundancy and can offer improved reliability in circuits where one element may fail.

Maximum Power Dissipation (Abs): 2.3 W

The maximum power dissipation of 2.3W indicates good thermal management and efficiency, allowing for continuous operation without overheating.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves board space and enables high-density board design while maintaining reliable performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology ensures high performance, low power consumption, and reliable operation in various industrial and consumer electronics applications.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature of 150 °C ensures stable performance in demanding environments and under varying thermal conditions.

Transistor Element Material: SILICON

Silicon material provides excellent electrical properties, high reliability, and compatibility with standard manufacturing processes, ensuring consistent performance.

Terminal Finish: TIN

The tin terminal finish offers good conductivity and solderability, ensuring secure connections and reliable performance in various operating conditions.

Maximum Drain-Source On Resistance: 0.065 ohm

The low on-resistance of 0.065 ohm minimizes power loss and improves efficiency in power switching applications, making this FET an ideal choice for high-performance circuits.

Terminal Position: DUAL

Dual terminal positioning allows for easy connection and layout flexibility in circuit design, enhancing ease of use and assembly.

Peak Reflow Temperature °C: 260

With a peak reflow temperature of 260 °C, this FET can withstand high-temperature soldering processes, ensuring reliable assembly and long-term performance.

Technical Specifications

Power Field Effect Transistors (FET) NTLJD3119CTAG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

3.8 A

Maximum Drain Current (ID):

2.6 A

Maximum Drain-Source On Resistance:

.065 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

S-PDSO-N6

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

SQUARE

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

18 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Transistor Element Material:

SILICON

Trade Compliance

NTLJD3119CTAG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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