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NTLJD4150PTBG

Onsemi

NTLJD4150PTBG by Onsemi

NTLJD4150PTBG by Onsemi is a P-CHANNEL FET with 30V DS Breakdown Voltage, suitable for SWITCHING applications. It features a max IDM of 14A and ID of 3.4A, with an RDS(on) of 0.135 ohm. This MOSFET operates in ENHANCEMENT MODE, has a max power dissipation of 2.3W, and can withstand temperatures from -55 to 150 °C.

Median Price

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Lifecycle Status

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1k+

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Vyrian

USA . 7,363 parts In-Stock

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Digiode

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AZTECH Wire

Italy . 1,089 parts In-Stock

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TANS Electronics

Latvia . 7,554 parts In-Stock

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Corphita

USA . 2,444 parts In-Stock

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SupplyDigital Components

Austria . 986 parts In-Stock

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Problanco Electronics

Mexico . 753 parts In-Stock

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UHIMA Technologies

Türkiye . 430 parts In-Stock

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GreenTree Electronics

Israel . 195 parts In-Stock

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Corohmni

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Kulean Microsystems

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Overview

Unlock the power of your electronic devices with the NTLJD4150PTBG by Onsemi. Crafted with precision and expertise, this P-CHANNEL Power Field Effect Transistor offers unparalleled performance in switching applications. With a built-in diode and a maximum pulsing drain current of 14A, this transistor ensures seamless operation even under high loads. Its small outline package design makes it perfect for space-constrained environments. Trust Onsemi to deliver quality and reliability in every product, providing you with the peace of mind you deserve. Elevate your projects with the NTLJD4150PTBG and experience the difference today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy package material provides good insulation and protection for the internal components of the FET, making it reliable and durable.

Polarity or Channel Type: P-CHANNEL

P-channel FETs generally have lower on-resistance and higher current-carrying capabilities compared to N-channel FETs, making them efficient for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for more efficient switching and protection against inductive kickback, enhancing the performance of the FET.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET is optimized for fast and reliable on/off transitions, ideal for power control circuits.

Surface Mount: YES

Being surface mountable makes the FET easy to assemble on PCBs, saving space and allowing for automated production processes.

Minimum DS Breakdown Voltage: 30 V

With a minimum breakdown voltage of 30V, this FET can handle higher voltage levels without breakdown, ensuring reliable performance in diverse applications.

Maximum Pulsed Drain Current (IDM): 14 A

The high pulsed drain current capability of 14A allows the FET to handle short bursts of higher currents, making it suitable for applications requiring high peak power.

Maximum Power Dissipation (Abs): 2.3 W

The FET's maximum power dissipation of 2.3W indicates its ability to handle heat dissipation efficiently, enabling continuous operation without overheating.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high temperatures, making it suitable for applications where heat dissipation is a concern.

Maximum Drain-Source On Resistance: 0.135 ohm

The low on-resistance of 0.135 ohm minimizes power losses and improves efficiency in the FET's operation, making it a reliable choice for power switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTLJD4150PTBG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

3.4 A

Maximum Drain Current (ID):

2.7 A

Maximum Drain-Source On Resistance:

.135 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

S-PDSO-N6

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

14 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTLJD4150PTBG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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