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NTLJF1103PT1G

Onsemi

NTLJF1103PT1G by Onsemi

NTLJF1103PT1G by Onsemi is a P-CHANNEL FET with 20V DS Breakdown Voltage and 17A IDM. Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with 0.135 ohm RDS(ON) and -55 to 150 °C temperature range.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Digiode

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Vyrian

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SupplyDigital Components

Austria . 7,757 parts In-Stock

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Problanco Electronics

Mexico . 2,432 parts In-Stock

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Corphita

USA . 1,691 parts In-Stock

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Kulean Microsystems

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Corohmni

South Africa . 308 parts In-Stock

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UHIMA Technologies

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TANS Electronics

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Overview

Power up your projects with the NTLJF1103PT1G by Onsemi. This P-Channel Power Field Effect Transistor (FET) offers reliable performance in switching applications, thanks to its enhancement mode technology and built-in diode configuration. With a maximum operating temperature of 150 °C, this transistor is ideal for a wide range of projects. Trust Onsemi's reputation for quality and innovation to bring value and efficiency to your designs. Elevate your work with the NTLJF1103PT1G today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material used in the package body provides durability and protection for the transistor, making it suitable for various environments and applications.

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low resistance and high efficiency, making them ideal for power management applications where low power dissipation is desired.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for convenient reverse polarity protection, enhancing the reliability and safety of the transistor in power switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast and efficient operation, making it suitable for use in power management circuits.

Surface Mount: YES

The surface mount feature allows for easy and convenient installation on PCBs, saving space and enabling high-density designs in electronic systems.

Minimum DS Breakdown Voltage: 20 V

With a minimum breakdown voltage of 20V, this FET can handle higher voltages without breakdown, ensuring reliable performance in various power applications.

Package Shape: RECTANGULAR

The rectangular package shape offers compatibility with standard PCB layouts and allows for efficient heat dissipation, enhancing the overall performance of the transistor.

Operating Mode: ENHANCEMENT MODE

The enhancement mode operation ensures low on-state resistance and high current handling capability, making this FET suitable for high-performance power switching applications.

Maximum Pulsed Drain Current (IDM): 17 A

With a maximum pulsed drain current of 17A, this FET can handle high power pulses and transient loads, making it suitable for applications that require high current switching capabilities.

No. of Terminals: 6

Having 6 terminals allows for easy connection and integration into circuit designs, providing flexibility and compatibility with various system configurations.

Package Style (Meter): SMALL OUTLINE

The small outline package style saves space on the PCB and allows for high-density mounting, making it suitable for compact electronic devices and systems.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

The metal-oxide semiconductor technology used in this FET provides high efficiency, low power dissipation, and fast switching speed, making it ideal for power management applications.

Maximum Operating Temperature: 150 °C

With a maximum operating temperature of 150 °C, this FET can withstand high-temperature environments, ensuring reliable performance under extreme conditions.

Transistor Element Material: SILICON

Silicon is a common and widely used semiconductor material known for its reliability, high conductivity, and low power dissipation, making it a suitable choice for power transistors.

Minimum Operating Temperature: -55 °C

With a minimum operating temperature of -55 °C, this FET can operate in cold environments without compromising performance, making it suitable for a wide range of applications.

Maximum Drain Current (ID): 2.4 A

The maximum drain current of 2.4A allows for efficient power handling and current flow, making this FET suitable for low to medium power applications.

Maximum Drain-Source On Resistance: 0.135 ohm

With a low on-resistance of 0.135 ohm, this FET minimizes power loss and heat dissipation, improving overall efficiency in power switching applications.

Terminal Position: DUAL

Having dual terminal positions provides flexibility in circuit design and allows for easy connection to other components, enhancing the versatility of this FET.

Case Connection: DRAIN

The drain case connection allows for efficient heat dissipation and current handling, ensuring stable operation and reliability in power management applications.

Technical Specifications

Power Field Effect Transistors (FET) NTLJF1103PT1G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

2.4 A

Maximum Drain-Source On Resistance:

.135 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

S-PDSO-N6

No. of Elements:

1

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

17 A

Surface Mount:

YES

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTLJF1103PT1G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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