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NTHD4508NT1

Onsemi

NTHD4508NT1 by Onsemi

NTHD4508NT1 by Onsemi is a N-CHANNEL FET with 20V DS Breakdown Voltage, ideal for SWITCHING applications. Features include 12A IDM, 3.1A ID, and 0.075ohm RDS(ON). Operating in ENHANCEMENT MODE, it has a max temp of 150 °C and turn on/off times of 40ns/26ns.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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NPI Materials, Inc.

USA . 2,447 parts In-Stock

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Vyrian

USA . 1,845 parts In-Stock

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Digiode

USA . 1,465 parts In-Stock

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A-Z Elektronik GmbH

Germany . 5,277 parts In-Stock

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Problanco Electronics

Mexico . 5,089 parts In-Stock

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TANS Electronics

Latvia . 3,902 parts In-Stock

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Kulean Microsystems

USA . 3,461 parts In-Stock

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SupplyDigital Components

Austria . 3,184 parts In-Stock

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Corphita

USA . 2,299 parts In-Stock

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UHIMA Technologies

Türkiye . 235 parts In-Stock

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Corohmni

South Africa . 221 parts In-Stock

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Overview

Discover the power and efficiency of the NTHD4508NT1 by Onsemi, a top-quality Power Field Effect Transistor that offers unparalleled performance in switching applications. With a single configuration and built-in diode, this N-CHANNEL transistor operates in enhancement mode, delivering reliability and precision. Ideal for a range of electronic devices, this product ensures seamless functionality and optimal energy consumption. Trust Onsemi's expertise in semiconductor technology to provide you with a cutting-edge solution that exceeds your expectations. Elevate your designs with the NTHD4508NT1 and experience the difference today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs generally have better performance and lower resistance compared to P-Channel FETs.

Configuration: SINGLE WITH BUILT-IN DIODE

Built-in diode allows for reverse current protection, enhancing the reliability of the transistor.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient operation.

Surface Mount: YES

Allows for easy and compact integration onto circuit boards, saving space.

Minimum DS Breakdown Voltage: 20 V

Suitable for low to medium voltage applications, providing protection against voltage spikes.

Maximum Drain-Source On Resistance: 0.075 ohm

Low on-resistance leads to lower power dissipation and higher efficiency.

Technical Specifications

Power Field Effect Transistors (FET) NTHD4508NT1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (Abs) (ID):

3.1 A

Maximum Drain Current (ID):

3 A

Maximum Drain-Source On Resistance:

.075 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

25 pF

JESD-30 Code:

R-PDSO-F8

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

12 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

FLAT

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Maximum Turn Off Time (toff):

26 ns

Maximum Turn On Time (ton):

40 ns

Trade Compliance

NTHD4508NT1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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