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NTHD3101FT3

Onsemi

NTHD3101FT3 by Onsemi

NTHD3101FT3 by Onsemi is a P-CHANNEL FET with 20V DS Breakdown Voltage, ideal for SWITCHING applications. Features include 13A IDM, 0.08 ohm RDS(on), and ENHANCEMENT MODE operation. This SMALL OUTLINE transistor has DUAL terminals and operates in METAL-OXIDE SEMICONDUCTOR technology.

Median Price

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Lifecycle Status

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2

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1k+

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Digiode

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Vyrian

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QUARKTWIN TECHNOLOGY LTD

USA . 12,382 parts In-Stock

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Kulean Microsystems

USA . 6,133 parts In-Stock

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SupplyDigital Components

Austria . 4,706 parts In-Stock

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Problanco Electronics

Mexico . 1,435 parts In-Stock

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TANS Electronics

Latvia . 1,275 parts In-Stock

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Corphita

USA . 598 parts In-Stock

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Corohmni

South Africa . 421 parts In-Stock

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UHIMA Technologies

Türkiye . 134 parts In-Stock

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Overview

Enhance your electronic devices with the NTHD3101FT3 by Onsemi, a top-tier Power Field Effect Transistor designed for optimal performance. Manufactured by Onsemi, a trusted name in the industry, this P-CHANNEL FET offers superior switching capabilities with a built-in diode, making it ideal for a wide range of applications. With a maximum pulsed drain current of 13A and a minimum DS breakdown voltage of 20V, this transistor delivers reliable power management solutions. Upgrade your electronics with the NTHD3101FT3 and experience the quality, efficiency, and innovation that Onsemi is known for.

Feature Benefit Bullets

Polarity or Channel Type: P-CHANNEL

P-channel FETs have lower on-resistance and higher current carrying capacity compared to N-channel FETs, making them suitable for high-side switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode provides reverse polarity protection and simplifies circuit design by eliminating the need for an external diode.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient control and regulation of power flow.

Minimum DS Breakdown Voltage: 20 V

With a minimum breakdown voltage of 20 V, this FET can handle voltage spikes and surges without malfunctioning, ensuring reliable operation.

Surface Mount: YES

Surface mount package allows for easy and convenient installation on PCBs, saving space and reducing assembly time.

Maximum Pulsed Drain Current (IDM): 13 A

High pulsed drain current rating enables the FET to handle short-term current spikes or overloads without damage.

Maximum Drain-Source On Resistance: 0.08 ohm

Low on-resistance reduces power loss and heat generation, resulting in improved efficiency and performance.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology provides enhanced performance, reliability, and efficiency compared to other FET technologies.

Technical Specifications

Power Field Effect Transistors (FET) NTHD3101FT3 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

3.2 A

Maximum Drain-Source On Resistance:

.08 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-C8

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

13 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

C BEND

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTHD3101FT3 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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