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NTHD2102PT1

Onsemi

NTHD2102PT1 by Onsemi

NTHD2102PT1 by Onsemi is a P-CHANNEL FET with 2 elements, built-in diode, and 0.058 ohm RDS(on). Ideal for switching applications with 3.4A max drain current and 8V min DS breakdown voltage. Features small outline package style and operates in enhancement mode.

Median Price

$0.366

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Bristol Electronics

USA . 4,438 parts In-Stock

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-

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$0.366

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$0.180

10k+ parts

$0.146

4,438

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$0.366

$0.180

$0.146

Dan-Mar Components

USA . 4,438 parts In-Stock

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Vyrian

USA . 3,672 parts In-Stock

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Atlantic Semiconductor

USA . 2,900 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 2,292 parts In-Stock

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Digiode

USA . 2,107 parts In-Stock

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Benley Electronics

USA . 2 parts In-Stock

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$0.750

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$0.750

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AZTECH Wire

Italy . 585 parts In-Stock

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$20.040

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Assy Fe

Spain . 12,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 6,735 parts In-Stock

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Authorized Procurement Solutions

USA . 6,000 parts In-Stock

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SupplyDigital Components

Austria . 5,941 parts In-Stock

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Kulean Microsystems

USA . 4,704 parts In-Stock

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Problanco Electronics

Mexico . 2,860 parts In-Stock

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TANS Electronics

Latvia . 2,172 parts In-Stock

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XScomponents

USA . 1,551 parts In-Stock

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$0.850

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Corphita

USA . 1,262 parts In-Stock

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UHIMA Technologies

Türkiye . 316 parts In-Stock

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Corohmni

South Africa . 265 parts In-Stock

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Kepictronics

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Overview

Enhance your electronic projects with the NTHD2102PT1 by Onsemi, a top-quality power field effect transistor perfect for switching applications. With its P-CHANNEL configuration and built-in diode, this component offers unmatched efficiency and reliability. Embrace the innovative technology of Onsemi and experience seamless performance like never before. Upgrade your devices today with the NTHD2102PT1 and unlock endless possibilities in the world of electronics.

Feature Benefit Bullets

Polarity or Channel Type: P-CHANNEL

P-channel FETs are suitable for low-side switching applications, offering lower Rds(on) and better efficiency compared to N-channel FETs for certain applications.

Configuration: SEPARATE, 2 ELEMENTS WITH BUILT-IN DIODE

The built-in diode ensures protection against reverse current flow, making this FET suitable for use in circuits where backflow of current needs to be prevented.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient power control in various electronic devices and circuits.

Surface Mount: YES

Ease of installation and space-saving design, making it suitable for compact electronic applications and PCB assembly.

Minimum DS Breakdown Voltage: 8 V

Provides reliable protection against voltage spikes and ensures the FET can handle higher voltages without breakdown.

Package Shape: RECTANGULAR

The rectangular package shape allows for easy integration into PCB designs and efficient use of space on the board.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer better control over the switching operation, providing improved efficiency and performance in switching applications.

Maximum Pulsed Drain Current (IDM): 4.6 A

Capable of handling high peak currents, suitable for applications with temporary high power requirements.

Maximum Drain Current (Abs) (ID): 3.4 A

Sufficient continuous current rating for various switching applications, ensuring reliable performance under normal operating conditions.

No. of Terminals: 8

Provides multiple connection points for flexibility in circuit design and connection options.

Maximum Power Dissipation (Abs): 2.1 W

Efficient power dissipation capability, ensuring the FET can handle power loads without overheating.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers high speed, low power consumption, and high input impedance, making it suitable for various electronic applications.

Transistor Element Material: SILICON

Silicon-based FETs are widely used in electronic devices due to their reliability, performance, and affordability.

Terminal Finish: TIN LEAD

Provides good solderability and durability, ensuring secure connections during installation and operation.

Maximum Drain-Source On Resistance: 0.058 ohm

Low Rds(on) resistance allows for efficient power handling and reduced power losses, making the FET suitable for high current applications.

Terminal Position: DUAL

Dual terminal position provides versatility in circuit connections and allows for different mounting options depending on the application requirements.

Peak Reflow Temperature °C: 235

High peak reflow temperature ensures robust solder joints and reliable PCB assembly, suitable for manufacturing processes requiring high-temperature soldering.

Technical Specifications

Power Field Effect Transistors (FET) NTHD2102PT1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Minimum DS Breakdown Voltage:

8 V

Maximum Drain Current (Abs) (ID):

3.4 A

Maximum Drain Current (ID):

3.4 A

Maximum Drain-Source On Resistance:

.058 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-XDSO-C8

JESD-609 Code:

e0

No. of Elements:

2

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

UNSPECIFIED

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

4.6 A

Qualification:

Not Qualified

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

C BEND

Terminal Position:

DUAL

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTHD2102PT1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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