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CPH6443-TL-W

Onsemi

CPH6443-TL-W by Onsemi

CPH6443-TL-W by Onsemi is a N-CHANNEL Power FET with 35V DS Breakdown Voltage, ideal for SWITCHING applications. It features 24A IDM and 6A ID, with 0.037 ohm RDS(ON) for efficient operation. This SMALL OUTLINE transistor operates in ENHANCEMENT MODE at up to 150°C, making it suitable for various power management tasks.

Median Price

$0.138

Lifecycle Status

Suppliers In-Stock

11

In-Stock Inventory

1k+

Distributors (Authorized)

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Arrow

USA . 32 parts In-Stock

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$0.115

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$0.115

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Rochester

USA . 950 parts In-Stock

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$0.162

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$0.152

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$0.138

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950

$0.162

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$0.138

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DigiKey

USA . 2 parts In-Stock

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$0.740

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$0.740

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Verical

USA . 83 parts In-Stock

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Chip1Stop

Japan . 32 parts In-Stock

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Digiode

USA . 774 parts In-Stock

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$0.154

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Flip Electronics

USA . 15,000 parts In-Stock

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Vyrian

USA . 3,586 parts In-Stock

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ACDS - Activité Composants Distribution Service

France . 797 parts In-Stock

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Dan-Mar Components

USA . 797 parts In-Stock

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Bristol Electronics

USA . 645 parts In-Stock

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$0.487

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$0.240

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$0.487

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Distributors (Availability)

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Corohmni

South Africa . 68 parts In-Stock

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Corphita

USA . 1,068 parts In-Stock

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$0.146

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Native Components

USA . 906 parts In-Stock

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$5.173

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$5.173

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Problanco Electronics

Mexico . 7,547 parts In-Stock

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TANS Electronics

Latvia . 7,364 parts In-Stock

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Kulean Microsystems

USA . 3,331 parts In-Stock

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Kepictronics

USA . 3,320 parts In-Stock

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RC Electronics

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Authorized Procurement Solutions

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SupplyDigital Components

Austria . 1,838 parts In-Stock

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Northwest PG Solutions

USA . 1,020 parts In-Stock

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$5.069

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UHIMA Technologies

Türkiye . 239 parts In-Stock

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Overview

Enhance your power management system with the CPH6443-TL-W by Onsemi - a top-quality Power Field Effect Transistor that boasts a single configuration with a built-in diode, perfect for switching applications. Manufactured by Onsemi, a trusted name in semiconductor technology, this N-channel transistor offers reliable performance and efficient power handling capabilities. Whether you're looking to upgrade your electronics or streamline your power control processes, this transistor is the ideal choice. Experience the value and benefits of superior quality with the CPH6443-TL-W by Onsemi.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection to the internal components, ensuring a longer lifespan for the FET.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their superior performance and efficiency, making this FET a good choice for various applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for efficient switching operations and helps protect against inductive voltage spikes.

Transistor Application: SWITCHING

Ideal for applications that require efficient switching of high currents, which is necessary for many power-related tasks.

Surface Mount: YES

Surface mount design allows for easy installation and integration onto circuit boards, saving space and reducing assembly time.

Minimum DS Breakdown Voltage: 35 V

With a high breakdown voltage, this FET can handle higher voltages without compromising performance or safety.

Maximum Pulsed Drain Current (IDM): 24 A

Capable of handling high pulsed currents, making it suitable for applications that require periodic high-power operation.

Maximum Power Dissipation (Abs): 1.6 W

Efficient power dissipation ensures that the FET can operate within safe temperature limits, increasing overall reliability.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can perform reliably even in high-temperature environments.

Maximum Drain-Source On Resistance: 0.037 ohm

Low on-resistance minimizes power losses and improves efficiency, making this FET suitable for high-performance applications.

Technical Specifications

Power Field Effect Transistors (FET) CPH6443-TL-W attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

ESD PROTECTED

Minimum DS Breakdown Voltage:

35 V

Maximum Drain Current (Abs) (ID):

6 A

Maximum Drain Current (ID):

6 A

Maximum Drain-Source On Resistance:

.037 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PDSO-G6

JESD-609 Code:

e6

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

24 A

Surface Mount:

YES

Terminal Finish:

TIN BISMUTH

Terminal Form:

GULL WING

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

CPH6443-TL-W Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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