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BLF6G10LS-160RN,11

NXP Semiconductors

BLF6G10LS-160RN,11 by NXP Semiconductors

BLF6G10LS-160RN,11 by NXP Semiconductors is a single N-channel MOSFET designed for enhancement mode operation. It supports a max drain current of 39 A and operates at temperatures up to 225 °C, making it ideal for high-power applications in RF amplifiers.

Median Price

$76.440

Lifecycle Status

Suppliers In-Stock

6

In-Stock Inventory

1k+

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RFMW

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Rochester

USA . 20 parts In-Stock

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$70.630

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$63.200

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$59.480

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Verical

USA . 20 parts In-Stock

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$82.250

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$74.375

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Digiode

USA . 290 parts In-Stock

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$66.500

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Vyrian

USA . 4,635 parts In-Stock

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Anansix

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AZTECH Wire

Italy . 748 parts In-Stock

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$15.050

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Corphita

USA . 612 parts In-Stock

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$63.000

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UNI Independent Distributors

Spain . 6,461 parts In-Stock

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Northwest PG Solutions

USA . 2,007 parts In-Stock

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Native Components

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Overview

Unlock unparalleled performance with the BLF6G10LS-160RN,11 from NXP Semiconductors. Renowned for their commitment to quality and innovation, NXP delivers a robust N-channel Power FET designed to excel in demanding applications. With exceptional efficiency and a high-temperature tolerance, this versatile transistor is ideal for RF amplification and industrial power management, ensuring reliability and peak performance in every project. Elevate your designs today!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility, making them more efficient for high-speed applications and power handling.

Configuration: SINGLE

Single configuration allows for simpler circuit design and integration, making it suitable for various applications.

Operating Mode: ENHANCEMENT MODE

The enhancement mode allows the transistor to be switched off and offers better control over the current, ideal for precision applications.

Maximum Drain Current (Abs) (ID): 39 A

With a maximum drain current of 39 A, this FET is capable of handling significant loads, making it suitable for high power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and low power consumption, enhancing the overall efficiency of the circuit.

Maximum Operating Temperature: 225 °C

A high operating temperature of 225 °C makes this FET reliable for use in harsh environments and demanding applications.

Maximum Drain Current (ID): 39 A

This reinforces its capability to handle substantial current loads, making it suitable for various heavy-duty electronic applications.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G10LS-160RN,11 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

39 A

Maximum Drain Current (ID):

39 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

225 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Trade Compliance

BLF6G10LS-160RN,11 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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