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BLF6G10-135RN,112

NXP Semiconductors

BLF6G10-135RN,112 by NXP Semiconductors

BLF6G10-135RN,112 by NXP Semiconductors is an N-channel enhancement mode FET ideal for high-power applications. It supports a max drain current of 32 A and operates up to 225 °C, making it suitable for demanding environments. This transistor excels in RF amplification and switching tasks.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Digiode

USA . 4,728 parts In-Stock

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Vyrian

USA . 3,893 parts In-Stock

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Anansix

USA . 230 parts In-Stock

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Northwest PG Solutions

USA . 380 parts In-Stock

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$3.531

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AZTECH Wire

Italy . 955 parts In-Stock

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One Stop Electronics

USA . 1,001 parts In-Stock

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$55.050

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Corphita

USA . 1,578 parts In-Stock

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UNI Independent Distributors

Spain . 1,192 parts In-Stock

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Native Components

USA . 993 parts In-Stock

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Overview

Unlock unparalleled performance with the BLF6G10-135RN,112 from NXP Semiconductors! Designed for efficiency and reliability, this N-channel power FET delivers exceptional current handling and thermal stability, making it ideal for demanding applications in telecommunications and industrial automation. Trust in NXP's legacy of innovation and quality to elevate your projects, ensuring enhanced durability, lower energy consumption, and superior output. Empower your designs today!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer lower on-resistance and higher electron mobility compared to P-channel devices, making them more efficient for power handling.

Configuration: SINGLE

A single configuration is ideal for applications where space is limited and only one switching element is necessary, simplifying the design and reducing potential points of failure.

Operating Mode: ENHANCEMENT MODE

Enhancement-mode transistors provide improved control and are normally off, which is beneficial for reducing power loss in standby applications.

Maximum Drain Current (Abs) (ID): 32 A

With a maximum drain current of 32 A, this FET can handle substantial loads, making it suitable for high-power applications and improving system reliability.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology enhances switching speeds and efficiency, allowing for faster response times in high-frequency applications.

Maximum Operating Temperature: 225 °C

A high maximum operating temperature of 225 °C ensures reliable performance in demanding environments, reducing the risk of thermal failure in critical applications.

Maximum Drain Current (ID): 32 A

The ability to handle up to 32 A again emphasizes this FET's robustness, making it well-suited for a variety of power electronic circuits that require high current capabilities.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G10-135RN,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

32 A

Maximum Drain Current (ID):

32 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

225 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Trade Compliance

BLF6G10-135RN,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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