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BLF6G15L-250PBRN,1

NXP Semiconductors

BLF6G15L-250PBRN,1 by NXP Semiconductors

BLF6G15L-250PBRN,1 from NXP Semiconductors is an N-channel power FET designed for high-performance applications. It features a max drain current of 64 A and operates at temperatures up to 200 °C. Ideal for RF amplification and switching in various electronic devices.

Median Price

$116.640

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

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RFMW

USA . 60 parts In-Stock

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60

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Rochester

USA . 2 parts In-Stock

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$116.640

1k+ parts

$104.360

10k+ parts

$98.220

2

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$116.640

$104.360

$98.220

Distributors (In-Stock)

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Digiode

USA . 159 parts In-Stock

1+ parts

$134.834

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159

$134.834

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Vyrian

USA . 6,761 parts In-Stock

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6,761

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Anansix

USA . 1,634 parts In-Stock

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1,634

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Distributors (Availability)

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Corphita

USA . 2,691 parts In-Stock

1+ parts

$127.737

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-

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2,691

$127.737

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Microchip USA

USA . 3,965 parts In-Stock

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$204.360

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3,965

$204.360

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UNI Independent Distributors

Spain . 5,993 parts In-Stock

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5,993

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Northwest PG Solutions

USA . 1,569 parts In-Stock

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1,569

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Native Components

USA . 585 parts In-Stock

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585

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Overview

Unlock the power of innovation with the BLF6G15L-250PBRN,1 from NXP Semiconductors. This robust N-channel MOSFET delivers outstanding efficiency and reliability, ideal for demanding applications like RF amplification and industrial control. Experience superior thermal performance and seamless integration in your designs, ensuring enhanced productivity and lower operational costs. Trust in NXP’s commitment to quality for solutions that drive your success!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically provide better performance and efficiency due to lower on-resistance, making them suitable for high-speed applications.

Surface Mount: YES

Surface mount technology (SMT) allows for compact designs and automated manufacturing, which can significantly reduce production costs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer higher device stability and are commonly used in digital applications, contributing to better power management.

Maximum Drain Current (Abs) (ID): 64 A

With a maximum drain current of 64 A, this FET can handle significant loads, making it ideal for high-power applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology ensures low power consumption and high efficiency, making this FET suitable for a variety of electronic devices.

Maximum Operating Temperature: 200 °C

The high maximum operating temperature of 200 °C allows the FET to operate effectively in demanding environments without risking damage.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G15L-250PBRN,1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

64 A

Maximum Drain Current (ID):

64 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Trade Compliance

BLF6G15L-250PBRN,1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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