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BLF6G10-200RN,112

NXP Semiconductors

BLF6G10-200RN,112 by NXP Semiconductors

BLF6G10-200RN,112 by NXP Semiconductors is a single N-channel MOSFET designed for enhancement mode operation. It supports a max drain current of 49 A and operates at temperatures up to 225 °C, making it ideal for high-power applications in RF amplifiers.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

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1k+

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Vyrian

USA . 7,654 parts In-Stock

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Anansix

USA . 249 parts In-Stock

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Digiode

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Andel Nordic

Denmark . 4,691 parts In-Stock

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$3.068

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$2.945

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One Stop Electronics

USA . 1,576 parts In-Stock

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AZTECH Wire

Italy . 247 parts In-Stock

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Component Stockers USA

USA . 397 parts In-Stock

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$99.990

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Authorized Procurement Solutions

USA . 142,000 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

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Corphita

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UNI Independent Distributors

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Native Components

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Northwest PG Solutions

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Overview

Unlock unparalleled performance with the BLF6G10-200RN,112 from NXP Semiconductors. Renowned for their innovative approach, NXP delivers superior quality and reliability in power FET technology. This N-channel transistor excels in demanding applications, ensuring efficient operation even in high-temperature environments. Embrace enhanced power management, reduced thermal stress, and longevity that elevate your projects to new heights. Choose excellence; choose NXP.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally provide higher electron mobility, resulting in better performance and efficiency.

Configuration: SINGLE

Single configuration simplifies circuit design and integration, making it easier to implement in various applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode allows for lower power consumption and excellent control of the output, ideal for switching applications.

Maximum Drain Current (Abs) (ID): 49 A

A maximum drain current of 49 A enables this FET to handle high power applications, improving its versatility.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for fast switching speeds and low power consumption, making it a suitable choice for modern electronics.

Maximum Operating Temperature: 225 °C

With a high maximum operating temperature of 225 °C, this FET is reliable for use in demanding environments.

Maximum Drain Current (ID): 49 A

The ability to handle up to 49 A ensures robustness and adaptability in various applications, particularly in power management.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G10-200RN,112 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

49 A

Maximum Drain Current (ID):

49 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

No. of Elements:

1

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

225 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Trade Compliance

BLF6G10-200RN,112 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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