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BLF6G10L-260PRN,11

NXP Semiconductors

BLF6G10L-260PRN,11 by NXP Semiconductors

BLF6G10L-260PRN,11 by NXP Semiconductors is an N-channel MOSFET designed for high-performance applications. It supports a max drain current of 64 A and operates at temperatures up to 200 °C. Ideal for power management in RF amplifiers and industrial systems.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Digiode

USA . 3,514 parts In-Stock

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Anansix

USA . 2,277 parts In-Stock

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Vyrian

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Northwest PG Solutions

USA . 1,658 parts In-Stock

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$3.212

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One Stop Electronics

USA . 1,434 parts In-Stock

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Corphita

USA . 4,544 parts In-Stock

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UNI Independent Distributors

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Native Components

USA . 154 parts In-Stock

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Overview

Unlock unparalleled performance with the BLF6G10L-260PRN,11 by NXP Semiconductors. Renowned for their commitment to quality, NXP delivers this powerful N-channel FET designed for demanding applications in RF amplification and industrial control. Experience superior efficiency and reliability in your designs, ensuring optimal operation even under extreme conditions. Elevate your projects with a trusted solution that guarantees exceptional value and long-term benefits!

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-Channel FETs are generally more efficient, offering better electron mobility, which leads to lower on-resistance and higher performance in power applications.

Surface Mount: YES

Surface Mount technology allows for a compact design, making this FET suitable for modern electronics where space-saving is crucial.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs are ideal for switching applications, providing high speed and efficiency in operation due to lower power consumption.

Maximum Drain Current (Abs) (ID): 64 A

With a maximum drain current of 64 A, this FET is capable of handling high power loads, making it suitable for demanding applications in power electronics.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology allows for high input impedance and low power consumption, making this FET efficient and effective for a wide range of applications.

Maximum Operating Temperature: 200 °C

The ability to operate at temperatures up to 200 °C ensures reliability and stability in extreme conditions, making it ideal for industrial and automotive applications.

Maximum Drain Current (ID): 64 A

Repeated specification indicates robust capability for high current applications, ensuring the FET can perform reliably under heavy loads.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G10L-260PRN,11 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

64 A

Maximum Drain Current (ID):

64 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

200 Cel

Polarity or Channel Type:

Sub-Category:

FET General Purpose Powers

Surface Mount:

YES

Trade Compliance

BLF6G10L-260PRN,11 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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