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BLF6G10L-40BRN,118

NXP Semiconductors

BLF6G10L-40BRN,118 by NXP Semiconductors

BLF6G10L-40BRN,118 from NXP Semiconductors is an N-channel power FET designed for enhancement mode operation. It supports a max drain current of 11 A and withstands peak reflow temps up to 260 °C. Ideal for high-efficiency switching applications in electronics.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Digiode

USA . 4,881 parts In-Stock

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Vyrian

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Anansix

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One Stop Electronics

USA . 1,234 parts In-Stock

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Northwest PG Solutions

USA . 2,257 parts In-Stock

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Corphita

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UNI Independent Distributors

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Native Components

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Overview

Elevate your designs with the BLF6G10L-40BRN,118 from NXP Semiconductors, a leader in innovative technology. This high-performance N-channel Power FET provides exceptional efficiency and reliability, making it ideal for demanding applications like RF amplification and power management. With its enhanced capabilities, you’ll enjoy reduced energy consumption and improved thermal performance, ensuring your projects excel with quality and durability that only NXP can deliver.

Feature Benefit Bullets

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally offer lower ON resistance and higher electron mobility, making them suitable for applications requiring efficient power management.

Surface Mount: YES

Surface mount technology allows for compact circuit designs, enabling high-density layouts and reducing assembly costs.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs provide high input impedance and are ideal for switching applications, ensuring minimal power loss at standby.

Maximum Drain Current (Abs) (ID): 11 A

With a maximum drain current rating of 11 A, this FET can handle substantial power loads, making it suitable for high-current applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOSFET technology offers excellent switching speeds and low power consumption, which are vital for modern electronic applications.

Maximum Drain Current (ID): 11 A

The capability of 11 A ensures robustness in high-performance designs, allowing the device to sustain variable operational environments.

Maximum Time At Peak Reflow Temperature (s): 30

Allowing a maximum time of 30 seconds at peak reflow temperature ensures good solder joint quality, which is crucial for product reliability.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C indicates compatibility with advanced soldering techniques, enhancing manufacturing efficiency.

Technical Specifications

Power Field Effect Transistors (FET) BLF6G10L-40BRN,118 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from NXP Semiconductors

Specs

Maximum Drain Current (Abs) (ID):

11 A

Maximum Drain Current (ID):

11 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Operating Mode:

ENHANCEMENT MODE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

BLF6G10L-40BRN,118 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

NXP Semiconductors

NXP is a leading semiconductor company that creates cutting-edge technology to power secure connections in a smarter world. Founded in 2006, they have grown to become one of the top five global semiconductor companies and serve their customers in over 70 countries around the world.

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Management team

Executive Director, President, CEO

Kurt Sievers

Executive VP, CFO

Bill Betz

Executive VP, Chief Sales Officer

Ron Martino

Manufacturer fab locations 7

Fab name Location Fab Initiation Wafer Capacity

ICN8

Fabrication

Fab Initiation

1996

Netherlands

Nijmegen

Wafer Capacity

55,000

1996

55,000

ATMC (Austin Tech & Mfg Center)

Fabrication

Fab Initiation

1995

USA

Austin

Wafer Capacity

30,000

1995

30,000

N/A

Fabrication

Fab Initiation

1989

Germany

Boeblingen

Wafer Capacity

1989

CHD

Fabrication

Fab Initiation

1993

USA

Chandler

Wafer Capacity

30,000

1993

30,000

OHTC

Fabrication

Fab Initiation

1991

USA

Austin

Wafer Capacity

24,000

1991

24,000

New Expansion Fab

Fabrication

Fab Initiation

2026

USA

Austin

Wafer Capacity

2026

ECHO

Fabrication

Fab Initiation

2020

USA

Chandler

Wafer Capacity

10,000

2020

10,000

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