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STI24NM65N

STMicroelectronics

STI24NM65N by STMicroelectronics

STI24NM65N by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 650V breakdown voltage, 76A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 6,154 parts In-Stock

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Anansix

USA . 1,118 parts In-Stock

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1,118

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Digiode

USA . 1,028 parts In-Stock

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1,028

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Bristol Electronics

USA . 40 parts In-Stock

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40

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Dan-Mar Components

USA . 40 parts In-Stock

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40

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IDEA Electronic Components Group

UK . 1,150 parts In-Stock

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$1.440

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$1.296

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$1.440

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$1.296

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MKK Technologies

India . 1,838 parts In-Stock

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$2.707

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$2.707

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DigiPath Technology Company

USA . 1,838 parts In-Stock

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$2.707

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1,838

$2.707

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AZTECH Wire

Italy . 573 parts In-Stock

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$15.840

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$15.840

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Alle Elektronik GmbH

Germany . 3,607 parts In-Stock

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3,607

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Authorized Procurement Solutions

USA . 3,500 parts In-Stock

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3,500

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RC Electronics

USA . 2,700 parts In-Stock

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2,700

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Corphita

USA . 2,680 parts In-Stock

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2,680

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Parana Technologies

USA . 1,944 parts In-Stock

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$1.722

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$1.722

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Overview

Elevate your designs with the STI24NM65N from STMicroelectronics, a trusted leader in innovation and quality. This powerful N-channel FET is engineered for seamless switching applications, delivering reliability and robust performance in demanding environments. With its superior breakdown voltage and avalanche energy rating, you can trust it to handle high-stress conditions. Experience enhanced efficiency and longevity, making it the ideal choice for industrial, automotive, and consumer electronics. Choose STI24NM65N for excellence that drives your projects forward!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Durable and lightweight, the plastic/epoxy package enhances reliability and reduces system weight.

Polarity or Channel Type: N-CHANNEL

N-channel configuration provides superior performance and lower on-resistance, making it ideal for high-efficiency applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The single configuration with a built-in diode simplifies circuit design and increases efficiency in switching applications.

Transistor Application: SWITCHING

Designed for switching applications, this FET allows for fast and reliable performance in power conversion.

Minimum DS Breakdown Voltage: 650 V

The high breakdown voltage ensures the device can handle a wide range of voltage levels, suitable for high-voltage applications.

Package Shape: RECTANGULAR

The rectangular shape promotes efficient layout on PCBs, optimizing space utilization and thermal management.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide robust mechanical support and excellent soldering quality, suitable for various mounting options.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation allows for lower power consumption and greater efficiency in electronic designs.

Maximum Pulsed Drain Current (IDM): 76 A

Able to handle high pulsed currents, this FET is ideal for demanding applications needing significant current bursts.

Avalanche Energy Rating (EAS): 500 mJ

This high avalanche energy rating indicates reliability under extreme conditions, making it suitable for rugged environments.

Maximum Drain Current (Abs) (ID): 19 A

This FET's capacity to sustain a maximum drain current of 19 A ensures stable performance under various operating conditions.

No. of Terminals: 3

Three terminals enhance versatility in circuit design, allowing for simplified connections and more compact layouts.

Maximum Power Dissipation (Abs): 160 W

High power dissipation capabilities enable effective thermal management, preventing overheating and increasing longevity.

Package Style (Meter): IN-LINE

In-line package style allows for ease of integration into circuits and enables utilize minimal board space.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology delivers fast switching speeds and enhances switching efficiency, ideal for modern electronic applications.

Maximum Operating Temperature: 150 °C

Withstanding high temperatures, this FET is suited for high-stress environments, ensuring reliable operation even in extreme heat.

Transistor Element Material: SILICON

Silicon material ensures effective electrical performance and stability, vital for long-lasting FET operation.

Terminal Finish: Matte Tin (Sn)

Matte tin finish improves solderability and prevents oxidation, enhancing the durability and reliability of the connections.

Maximum Drain Current (ID): 19 A

The capability to handle a maximum drain current of 19 A indicates high performance, essential for power applications.

Maximum Drain-Source On Resistance: 0.19 ohm

Low on-resistance minimizes power losses during operation, contributing to the overall efficiency of the circuit.

Terminal Position: SINGLE

The single terminal position allows for compact integration into designs, facilitating a more straightforward layout.

Technical Specifications

Power Field Effect Transistors (FET) STI24NM65N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

500 mJ

Minimum DS Breakdown Voltage:

650 V

Maximum Drain Current (Abs) (ID):

19 A

Maximum Drain Current (ID):

19 A

Maximum Drain-Source On Resistance:

.19 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

76 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn)

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STI24NM65N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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