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STI23NM60ND

STMicroelectronics

STI23NM60ND by STMicroelectronics

STI23NM60ND by STMicroelectronics is a powerful N-channel FET designed for switching applications. It features a 600V breakdown voltage, 19.5A max drain current, and operates at up to 150 °C. Ideal for high-efficiency power management in various electronic devices.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 4,823 parts In-Stock

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Digiode

USA . 2,872 parts In-Stock

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Anansix

USA . 73 parts In-Stock

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IDEA Electronic Components Group

UK . 821 parts In-Stock

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$1.627

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$1.465

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821

$1.627

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$1.465

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MKK Technologies

India . 1,312 parts In-Stock

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$3.060

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DigiPath Technology Company

USA . 1,312 parts In-Stock

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$3.060

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$3.060

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AZTECH Wire

Italy . 505 parts In-Stock

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$11.510

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505

$11.510

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 15,717 parts In-Stock

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A-Z Elektronik GmbH

Germany . 4,829 parts In-Stock

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Corphita

USA . 4,503 parts In-Stock

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Alle Elektronik GmbH

Germany . 3,577 parts In-Stock

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Parana Technologies

USA . 995 parts In-Stock

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$1.946

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995

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$1.946

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Overview

Unlock the potential of your projects with the STI23NM60ND from STMicroelectronics, a leader in innovation and reliability. This N-channel power FET combines exceptional performance with a robust built-in diode, making it ideal for efficient switching applications across diverse industries. With high voltage capabilities and impressive thermal management, this versatile component ensures durability and efficiency in demanding environments. Elevate your designs with trusted quality and unmatched advantages!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of durable plastic/epoxy material ensures strong protection and reliability for the transistor in various environments.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer better performance and efficiency in switching applications, making this product suitable for high-speed operations.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies the circuit design and helps in managing reverse currents effectively, promoting reliability.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET is optimized for rapid on-off control, improving the efficiency of electronic circuits.

Minimum DS Breakdown Voltage: 600 V

With a high breakdown voltage, this transistor can be used in high-voltage applications, enhancing its versatility across various electronic devices.

Package Shape: RECTANGULAR

The rectangular package design facilitates easy integration into circuit boards, optimizing space and layout efficiency.

Terminal Form: THROUGH-HOLE

Through-hole mounting provides strong mechanical support and is suitable for high-power applications, ensuring secure connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode operation enables better control over the transistor's conductive state, allowing for lower power consumption.

Maximum Pulsed Drain Current (IDM): 78 A

A high pulsed drain current rating indicates the transistor’s capability to handle short bursts of high current, making it ideal for dynamic applications.

Avalanche Energy Rating (EAS): 700 mJ

With a high avalanche energy rating, this FET can withstand transient voltage spikes, enhancing circuit protection.

Maximum Drain Current (Abs) (ID): 19.5 A

The maximum drain current of 19.5 A indicates that this transistor can handle substantial current loads, suitable for demanding applications.

No. of Terminals: 3

The three-terminal design simplifies integration into circuits while providing all necessary connections for functionality.

Maximum Power Dissipation (Abs): 150 W

A power dissipation rating of 150 W allows for efficient heat management, reducing the risk of thermal failure in high-power applications.

Package Style (Meter): IN-LINE

The in-line package style offers a streamlined shape that aids in maintaining a tidy setup on circuit boards.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high input impedance and fast switching capabilities, making this product suitable for advanced electronic applications.

Maximum Operating Temperature: 150 °C

Operating at a high temperature allows for the device to function in demanding environments without compromising performance.

Transistor Element Material: SILICON

Silicon as a semiconductor material ensures good thermal conductivity and efficiency in operation, making it reliable for various applications.

Terminal Finish: Matte Tin (Sn) - annealed

The matte tin finish improves solderability and reduces oxidation, ensuring durable and reliable electrical connections.

Maximum Drain Current (ID): 19.5 A

The reiterated maximum drain current indicates consistent performance capability in handling significant loads without degradation.

Maximum Drain-Source On Resistance: 0.18 ohm

A low on-resistance value leads to reduced power losses during operation, enhancing device efficiency in both switching and linear applications.

Terminal Position: SINGLE

Single-terminal position simplifies installation and integration processes, improving overall circuit design efficiency.

Maximum Time At Peak Reflow Temperature (s): 30

The specified reflow time indicates the device's ability to withstand soldering processes, enhancing manufacturing reliability.

Peak Reflow Temperature °C: 260

A peak reflow temperature of 260 °C ensures compatibility with standard soldering processes, making it easier to assemble in various applications.

Technical Specifications

Power Field Effect Transistors (FET) STI23NM60ND attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Avalanche Energy Rating (EAS):

700 mJ

Minimum DS Breakdown Voltage:

600 V

Maximum Drain Current (Abs) (ID):

19.5 A

Maximum Drain Current (ID):

19.5 A

Maximum Drain-Source On Resistance:

.18 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

78 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STI23NM60ND Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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