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STI20NM65N

STMicroelectronics

STI20NM65N by STMicroelectronics

STI20NM65N by STMicroelectronics is an N-channel FET designed for efficient switching applications. It features a 650V breakdown voltage, 76A max pulsed drain current, and operates at up to 150 °C. Ideal for power management in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Vyrian

USA . 4,006 parts In-Stock

1+ parts

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4,006

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Anansix

USA . 2,842 parts In-Stock

1+ parts

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2,842

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Digiode

USA . 1,813 parts In-Stock

1+ parts

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1,813

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 2,293 parts In-Stock

1+ parts

$1.692

100+ parts

-

1k+ parts

$1.523

10k+ parts

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2,293

$1.692

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$1.523

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MKK Technologies

India . 703 parts In-Stock

1+ parts

$3.181

100+ parts

-

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703

$3.181

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DigiPath Technology Company

USA . 703 parts In-Stock

1+ parts

$3.181

100+ parts

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703

$3.181

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Corphita

USA . 3,889 parts In-Stock

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3,889

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Parana Technologies

USA . 1,179 parts In-Stock

1+ parts

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100+ parts

$2.023

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1,179

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$2.023

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Overview

Elevate your designs with the STI20NM65N from STMicroelectronics, a leader in innovation and quality. This N-channel Power FET excels in switching applications, providing robust performance under high voltage conditions. With its built-in diode and exceptional power dissipation capabilities, it ensures reliability and efficiency. Ideal for industrial and consumer electronics, this transistor empowers engineers to create cutting-edge solutions with confidence and precision.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This durable material provides excellent protection and thermal efficiency, enhancing the reliability of the transistor.

Polarity or Channel Type: N-CHANNEL

N-channel FETs are known for their high efficiency and low on-resistance, making them suitable for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The integrated diode simplifies design and improves response time for switching applications.

Transistor Application: SWITCHING

Optimized for switching applications, this FET ensures high-speed performance, ideal for power management solutions.

Minimum DS Breakdown Voltage: 650 V

A high breakdown voltage indicates robustness in high-voltage applications, enhancing safety and reliability.

Package Shape: RECTANGULAR

The rectangular shape allows for efficient PCB layout and space-saving designs.

Terminal Form: THROUGH-HOLE

Through-hole terminals provide improved mechanical stability and ease of soldering for secure connections.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer high input impedance and lower power consumption, making them energy-efficient.

Maximum Pulsed Drain Current (IDM): 76 A

The ability to handle high pulsed currents makes this FET suitable for demanding applications requiring significant power handling.

Avalanche Energy Rating (EAS): 500 mJ

A high avalanche energy rating ensures that the FET can withstand transient conditions without failure.

Maximum Drain Current (Abs) (ID): 19 A

This high maximum drain current rating allows the FET to handle substantial loads in various applications.

No. of Terminals: 3

A three-terminal configuration is standard for ease of integration with other electronic components.

Maximum Power Dissipation (Abs): 160 W

With a high power dissipation capability, this FET can operate efficiently in high-power circuits.

Package Style (Meter): IN-LINE

The in-line package style is compatible with a wide range of circuits, facilitating versatile applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology provides high-speed operation and excellent switching performance, making it suitable for modern applications.

Maximum Operating Temperature: 150 °C

A high operating temperature rating indicates durability and reliability in high-heat environments.

Transistor Element Material: SILICON

Silicon as the material ensures good electrical properties and widespread compatibility in electronic designs.

Terminal Finish: MATTE TIN

Matte tin finish ensures better solderability and oxidation resistance, improving overall longevity of connections.

Maximum Drain-Source On Resistance: 0.19 ohm

A low on-resistance leads to less power loss and higher efficiency in switching applications.

Terminal Position: SINGLE

Single terminal position simplifies circuit design and reduces layout complexity.

Maximum Time At Peak Reflow Temperature (s): 40

A longer time at peak reflow allows for robust solder connections, ensuring durability.

Peak Reflow Temperature °C: 245

The high peak reflow temperature indicates compatibility with modern manufacturing processes for reliable assembly.

Technical Specifications

Power Field Effect Transistors (FET) STI20NM65N attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

AVALANCHE RATED

Avalanche Energy Rating (EAS):

500 mJ

Minimum DS Breakdown Voltage:

650 V

Maximum Drain Current (Abs) (ID):

19 A

Maximum Drain Current (ID):

19 A

Maximum Drain-Source On Resistance:

.19 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JEDEC-95 Code:

TO-262AA

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e3

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Peak Reflow Temperature (C):

245

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

76 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

MATTE TIN

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

STI20NM65N Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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