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NTMYS3D8N04CLTWG

Onsemi

NTMYS3D8N04CLTWG by Onsemi

NTMYS3D8N04CLTWG by Onsemi is a N-CHANNEL Power FET with 40V DS Breakdown Voltage and 520A IDM. Ideal for applications requiring high power dissipation, such as motor control systems or power supplies. Features include a built-in diode, small outline package style, and -55 to 175 °C operating temperature range.

Median Price

$2.070

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

DigiKey

USA . 2,480 parts In-Stock

1+ parts

$2.070

100+ parts

$0.894

1k+ parts

$0.673

10k+ parts

$0.550

2,480

$2.070

$0.894

$0.673

$0.550

Distributors (In-Stock)

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Flip Electronics

USA . 3,000 parts In-Stock

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Vyrian

USA . 2,263 parts In-Stock

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Digiode

USA . 846 parts In-Stock

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Microchip USA

USA . 8,089 parts In-Stock

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$10.355

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QUARKTWIN TECHNOLOGY LTD

USA . 16,041 parts In-Stock

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Kulean Microsystems

USA . 7,714 parts In-Stock

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SupplyDigital Components

Austria . 4,756 parts In-Stock

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TANS Electronics

Latvia . 2,431 parts In-Stock

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Corphita

USA . 1,378 parts In-Stock

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Problanco Electronics

Mexico . 542 parts In-Stock

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UHIMA Technologies

Türkiye . 216 parts In-Stock

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Corohmni

South Africa . 92 parts In-Stock

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Overview

Looking for high-quality Power Field Effect Transistors? Look no further than the NTMYS3D8N04CLTWG by Onsemi. With a reputation for excellence, Onsemi delivers top-notch products like this N-Channel FET with built-in diode, perfect for a variety of applications. Offering outstanding performance and reliability, this transistor is a game-changer for your projects. Trust Onsemi to provide the best in semiconductor technology, making your work easier and more efficient. Elevate your designs with the NTMYS3D8N04CLTWG and experience the difference today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and protection for the internal components of the FET.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility, making them suitable for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for reverse current protection, increasing the reliability of the device.

Surface Mount: YES

Enables easy installation on PCBs, saving space and facilitating mass production.

Minimum DS Breakdown Voltage: 40 V

With a high breakdown voltage, this FET can handle higher voltage applications without risk of failure.

Maximum Drain Current (ID): 87 A

Capable of handling high current loads, suitable for power applications.

Maximum Power Dissipation (Abs): 55 W

Can efficiently dissipate heat generated during operation, ensuring reliability under high power conditions.

Maximum Operating Temperature: 175 °C

Operates reliably at high temperatures, suitable for demanding industrial environments.

Maximum Drain-Source On Resistance: 0.006 ohm

Low on-resistance minimizes power loss and heat generation, improving efficiency.

Technical Specifications

Power Field Effect Transistors (FET) NTMYS3D8N04CLTWG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

202 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

87 A

Maximum Drain Current (ID):

87 A

Maximum Drain-Source On Resistance:

.006 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

21 pF

JESD-30 Code:

R-PSSO-G4

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

520 A

Surface Mount:

YES

Terminal Finish:

Matte Tin (Sn) - annealed

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Trade Compliance

NTMYS3D8N04CLTWG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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