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NTLUS3A18PZCTAG

Onsemi

NTLUS3A18PZCTAG by Onsemi

NTLUS3A18PZCTAG by Onsemi is a P-CHANNEL FET with 8.2A max drain current and 3.8W max power dissipation. Ideal for applications requiring high power handling in surface mount configurations, such as automotive electronics and industrial control systems.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 4,343 parts In-Stock

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Flip Electronics

USA . 2,800 parts In-Stock

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2,800

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Digiode

USA . 347 parts In-Stock

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347

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AZTECH Wire

Italy . 698 parts In-Stock

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$22.220

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698

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Perfect Parts

USA . 14,364 parts In-Stock

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SupplyDigital Components

Austria . 5,311 parts In-Stock

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Kulean Microsystems

USA . 5,097 parts In-Stock

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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5,000

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Problanco Electronics

Mexico . 3,660 parts In-Stock

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Kepictronics

USA . 3,500 parts In-Stock

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3,500

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TANS Electronics

Latvia . 3,315 parts In-Stock

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GreenTree Electronics

Israel . 2,525 parts In-Stock

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Corphita

USA . 2,279 parts In-Stock

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Corohmni

South Africa . 358 parts In-Stock

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UHIMA Technologies

Türkiye . 311 parts In-Stock

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Overview

Upgrade your electronics with the NTLUS3A18PZCTAG P-CHANNEL Small Signal FET from Onsemi. With a single configuration and surface mount design, this transistor offers high-quality performance and reliability in a variety of applications. Whether you're building a new project or replacing outdated components, this FET provides a maximum drain current of 8.2 A and a maximum power dissipation of 3.8 W, ensuring optimal functionality. Trust Onsemi's expertise and experience to deliver value and efficiency to your electronics projects.

Feature Benefit Bullets

Polarity or Channel Type: P-CHANNEL

P-channel FETs are known for their low on-state resistance and high efficiency, making them suitable for power management applications.

Configuration: SINGLE

Single configuration makes it easy to integrate into circuits and reduces complexity in design.

Surface Mount: YES

Surface mount technology allows for compact and space-saving designs, ideal for smaller electronic devices.

Maximum Drain Current (Abs) (ID): 8.2 A

High maximum drain current allows for handling higher power levels without overheating, increasing reliability.

Maximum Power Dissipation (Abs): 3.8 W

High maximum power dissipation means the FET can handle power efficiently and effectively, reducing the risk of overheating.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology provides excellent switching characteristics and low leakage current, offering high performance.

Maximum Operating Temperature: 150 °C

With a high maximum operating temperature, this FET can withstand harsh environmental conditions and maintain stability.

Terminal Finish: TIN

Tin terminal finish ensures good solderability and conductivity, facilitating easy assembly in manufacturing processes.

Maximum Time At Peak Reflow Temperature (s): 30

Quick reflow time ensures efficient soldering processes, improving manufacturing throughput.

Peak Reflow Temperature °C: 260

High peak reflow temperature capability enables reliable soldering and ensures strong mechanical connections.

Technical Specifications

Small Signal Field Effect Transistors (FET) NTLUS3A18PZCTAG attributes and parameters. Explore more Small Signal Field Effect Transistors (FET) devices from Onsemi

Specs

Configuration:

Maximum Drain Current (Abs) (ID):

8.2 A

Maximum Drain Current (ID):

8.2 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

Maximum Operating Temperature:

150 Cel

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Sub-Category:

Other Transistors

Surface Mount:

YES

Terminal Finish:

TIN

Maximum Time At Peak Reflow Temperature (s):

30

Trade Compliance

NTLUS3A18PZCTAG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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