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NTB60N06LT4

Onsemi

NTB60N06LT4 by Onsemi

NTB60N06LT4 by Onsemi is a N-CHANNEL FET with 60V DS Breakdown Voltage, 180A IDM, and 0.016 ohm RDS. Ideal for SWITCHING applications due to its SINGLE configuration with BUILT-IN DIODE. Operates in ENHANCEMENT MODE at up to 175°C, making it suitable for high-power tasks.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 2,852 parts In-Stock

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Digiode

USA . 1,907 parts In-Stock

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Nova Conductors

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AZTECH Wire

Italy . 505 parts In-Stock

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$7.725

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Ampacity Inc.

Singapore . 287 parts In-Stock

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$27.050

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Component Stockers USA

USA . 462 parts In-Stock

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$99.990

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Kepictronics

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Problanco Electronics

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SupplyDigital Components

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Argo Parts USA

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Kulean Microsystems

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Corphita

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Continental Prestige Electronics

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Corohmni

South Africa . 265 parts In-Stock

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UHIMA Technologies

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TANS Electronics

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Bastille Electronics

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Overview

Experience the exceptional quality and reliability of Onsemi with the NTB60N06LT4 Power Field Effect Transistor. This N-channel transistor is designed for switching applications, offering a high level of performance and efficiency. With a maximum drain current of 60A and a low on-resistance of 0.016 ohm, this transistor provides exceptional power dissipation capabilities. Whether you're working on industrial equipment or automotive systems, the NTB60N06LT4 offers unmatched value and benefits to meet your needs. Trust in Onsemi for top-tier technology that delivers superior results every time.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy body material provides good durability and protection for the internal components of the FET, making it a reliable choice for various applications.

Polarity or Channel Type: N-CHANNEL

The N-channel type allows for efficient current flow in one direction, making this FET suitable for use in switching applications where a unidirectional current flow is required.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps to prevent reverse current flow, offering added protection for the circuit and enhancing the overall efficiency of the FET.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast response times and high efficiency, making it ideal for use in power management systems.

Surface Mount: YES

The surface mount capability of this FET allows for easy installation on PCBs, saving space and simplifying the overall design of the circuit.

Minimum DS Breakdown Voltage: 60V

With a minimum breakdown voltage of 60V, this FET can handle high voltage levels, making it suitable for use in applications where voltage spikes may occur.

Package Shape: RECTANGULAR

The rectangular package shape provides a compact and space-saving design, making it ideal for use in applications where size constraints are a concern.

Terminal Form: GULL WING

The gull wing terminal form offers secure solder connections and easy installation, ensuring a reliable electrical connection for the FET.

Operating Mode: ENHANCEMENT MODE

Operating in enhancement mode allows for precise control over the FET's conductivity, making it suitable for applications where fine-tuning of power levels is required.

Maximum Pulsed Drain Current (IDM): 180A

With a maximum pulsed drain current of 180A, this FET can handle high transient currents, making it a robust choice for applications with varying power requirements.

Technical Specifications

Power Field Effect Transistors (FET) NTB60N06LT4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

454 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.016 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

180 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin/Lead (Sn/Pb)

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB60N06LT4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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