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NTB6448ANG

Onsemi

NTB6448ANG by Onsemi

NTB6448ANG by Onsemi is a N-CHANNEL FET with 100V DS Breakdown Voltage, 305A IDM, and 0.013 ohm RDS(on). Ideal for power applications requiring high drain current handling and low on-resistance. Suitable for use in enhancement mode operation at up to 175 °C temperature.

Median Price

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2

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1k+

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Vyrian

USA . 5,348 parts In-Stock

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Digiode

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AZTECH Wire

Italy . 40 parts In-Stock

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$13.970

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Component Stockers USA

USA . 753 parts In-Stock

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$99.990

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Metaverse IC Inc.

Canada . 56,986 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 26,991 parts In-Stock

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Problanco Electronics

Mexico . 6,016 parts In-Stock

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SupplyDigital Components

Austria . 4,588 parts In-Stock

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Kulean Microsystems

USA . 2,094 parts In-Stock

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Corphita

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TANS Electronics

Latvia . 1,110 parts In-Stock

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UHIMA Technologies

Türkiye . 538 parts In-Stock

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Corohmni

South Africa . 326 parts In-Stock

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Overview

Enhance your power management solutions with the Onsemi NTB6448ANG Power FET. Manufactured by industry leader Onsemi, this N-channel FET offers exceptional quality and reliability for a wide range of applications. With a built-in diode and high breakdown voltage, this FET delivers superior performance and efficiency. Say goodbye to overheating and hello to optimized power flow with the NTB6448ANG. Trust Onsemi to provide cutting-edge technology that meets your needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material makes the product lightweight and durable, ideal for various applications.

Polarity or Channel Type: N-CHANNEL

N-CHANNEL FETs are known for their high efficiency and low on-resistance, making them suitable for high-power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and improves overall efficiency of the system.

Surface Mount: YES

Surface mount capability makes it easier to assemble and integrate into circuit boards, saving space and reducing overall system size.

Minimum DS Breakdown Voltage: 100 V

The high breakdown voltage ensures reliable operation and protection against voltage spikes in the circuit.

Maximum Pulsed Drain Current (IDM): 305 A

The high pulsed drain current rating allows for handling high power and transient load conditions effectively.

Avalanche Energy Rating (EAS): 500 mJ

The high avalanche energy rating makes the device robust and able to withstand energy spikes in the circuit.

Maximum Power Dissipation (Abs): 188 W

With a high power dissipation rating, the FET can handle high power applications without overheating.

Maximum Drain-Source On Resistance: 0.013 ohm

The low on-resistance ensures efficient power transfer and minimal heat generation during operation.

Maximum Operating Temperature: 175 °C

The high operating temperature rating allows for operation in harsh environments without compromising performance.

Technical Specifications

Power Field Effect Transistors (FET) NTB6448ANG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

500 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

76 A

Maximum Drain Current (ID):

76 A

Maximum Drain-Source On Resistance:

.013 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

305 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Element Material:

SILICON

Trade Compliance

NTB6448ANG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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