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NTB60N06LG

Onsemi

NTB60N06LG by Onsemi

NTB60N06LG by Onsemi is a N-CHANNEL Power FET with 60V DS Breakdown Voltage and 180A IDM. Ideal for SWITCHING applications, it features a built-in diode, 0.016 ohm RDS(on), and 150W Pdiss. This METAL-OXIDE SEMICONDUCTOR FET operates in ENHANCEMENT MODE at up to 175°C, making it suitable for high-power electronics.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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Vyrian

USA . 4,694 parts In-Stock

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Digiode

USA . 2,192 parts In-Stock

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Nova Conductors

Japan . 870 parts In-Stock

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Ampacity Inc.

Singapore . 1,258 parts In-Stock

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$16.050

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AZTECH Wire

Italy . 382 parts In-Stock

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$16.412

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Kepictronics

USA . 20,000 parts In-Stock

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SupplyDigital Components

Austria . 6,980 parts In-Stock

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Continental Prestige Electronics

USA . 5,555 parts In-Stock

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TANS Electronics

Latvia . 4,313 parts In-Stock

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Problanco Electronics

Mexico . 1,327 parts In-Stock

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UHIMA Technologies

Türkiye . 800 parts In-Stock

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800

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Argo Parts USA

USA . 483 parts In-Stock

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Corohmni

South Africa . 441 parts In-Stock

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Kulean Microsystems

USA . 372 parts In-Stock

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Corphita

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Bastille Electronics

Australia . 40 parts In-Stock

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Overview

Unleash the power of innovation with the Onsemi NTB60N06LG Power Field Effect Transistor. Crafted with precision by the renowned manufacturer Onsemi, this N-CHANNEL transistor offers unparalleled quality and reliability for a wide range of switching applications. With a maximum pulsed drain current of 180A and an avalanche energy rating of 454mJ, this transistor guarantees superior performance and efficiency. Say goodbye to limitations and embrace limitless possibilities with the NTB60N06LG. Elevate your projects to new heights with this cutting-edge technology that delivers exceptional value and benefits, setting you apart from the competition.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good insulation, durability, and protection for the internal components, making the product reliable for long-term use.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have better performance characteristics and lower on-state resistance compared to P-channel FETs, making them suitable for high-speed switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode helps to protect the circuit from voltage spikes and reverse polarity, enhancing the overall reliability of the product.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers efficient and fast switching speeds, making it ideal for power management in various electronic devices.

Surface Mount: YES

Surface mount technology allows for easy and compact integration onto circuit boards, saving space and simplifying assembly processes.

Minimum DS Breakdown Voltage: 60 V

With a minimum breakdown voltage of 60V, this FET can handle higher voltages without breakdown, providing a safety margin for the system.

Maximum Pulsed Drain Current (IDM): 180 A

The high pulsed drain current rating allows for reliable operation under high current surges, making it suitable for demanding applications.

Maximum Drain-Source On Resistance: 0.016 ohm

The low on-resistance results in minimal power loss and heat generation during operation, improving efficiency and reliability of the product.

Maximum Operating Temperature: 175 °C

With a maximum operating temperature of 175°C, this FET can operate in high-temperature environments without performance degradation.

Technical Specifications

Power Field Effect Transistors (FET) NTB60N06LG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Additional Features:

LOGIC LEVEL COMPATIBLE

Avalanche Energy Rating (EAS):

454 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

60 A

Maximum Drain Current (ID):

60 A

Maximum Drain-Source On Resistance:

.016 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

180 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTB60N06LG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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