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NVD5803NT4G

Onsemi

NVD5803NT4G by Onsemi

NVD5803NT4G by Onsemi is a Power FET with N-CHANNEL configuration, ideal for SWITCHING applications. Features include 40V DS Breakdown Voltage, 228A Pulsed Drain Current, and 0.0057 ohm Drain-Source On Resistance. Suitable for high-power switching circuits in various electronic devices.

Median Price

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Lifecycle Status

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4

In-Stock Inventory

1k+

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Flip Electronics

USA . 75,000 parts In-Stock

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Vyrian

USA . 2,937 parts In-Stock

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Digiode

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AZTECH Wire

Italy . 311 parts In-Stock

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$21.210

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QUARKTWIN TECHNOLOGY LTD

USA . 28,426 parts In-Stock

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Problanco Electronics

Mexico . 7,943 parts In-Stock

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A-Z Elektronik GmbH

Germany . 7,265 parts In-Stock

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Kulean Microsystems

USA . 6,622 parts In-Stock

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Perfect Parts

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TANS Electronics

Latvia . 5,019 parts In-Stock

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Authorized Procurement Solutions

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SupplyDigital Components

Austria . 1,351 parts In-Stock

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iodParts Technologies Inc.

India . 900 parts In-Stock

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Corphita

USA . 781 parts In-Stock

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UHIMA Technologies

Türkiye . 445 parts In-Stock

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Corohmni

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Overview

Enhance your power management system with the Onsemi NVD5803NT4G Power Field Effect Transistor. Manufactured by industry leader Onsemi, this N-CHANNEL FET offers reliable switching capabilities and a built-in diode for added convenience. Ideal for a variety of applications, this transistor delivers high performance with a maximum pulsed drain current of 228 A and a low on resistance of 0.0057 ohm. Trust in the quality and innovation of Onsemi to optimize your power control needs.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection for the FET, ensuring a longer lifespan.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and saves space on the PCB.

Transistor Application: SWITCHING

Designed specifically for switching applications, making it efficient and reliable in those scenarios.

Surface Mount: YES

Easy to integrate onto a PCB, saving time and effort during assembly.

Minimum DS Breakdown Voltage: 40 V

With a high breakdown voltage, this FET can handle higher voltage levels without failure.

Maximum Pulsed Drain Current (IDM): 228 A

Capable of handling high peak currents, suitable for demanding applications.

Maximum Power Dissipation (Abs): 83 W

Efficient power handling capability, ensuring the FET remains cool under high loads.

Maximum Operating Temperature: 175 °C

Can operate at high temperatures without performance degradation, suitable for harsh environments.

Technical Specifications

Power Field Effect Transistors (FET) NVD5803NT4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

240 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

85 A

Maximum Drain Current (ID):

85 A

Maximum Drain-Source On Resistance:

.0057 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

228 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NVD5803NT4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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