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NVD5806NT4G

Onsemi

NVD5806NT4G by Onsemi

NVD5806NT4G by Onsemi is a power FET with 40V DS breakdown voltage, 33A max drain current, and 0.019 ohm RDS(on). Ideal for switching applications in automotive electronics due to AEC-Q101 standard compliance. Features include single configuration with built-in diode, Gull Wing terminals, and small outline package style.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Chip Stock

USA . 31,000 parts In-Stock

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Vyrian

USA . 10,267 parts In-Stock

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Digiode

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AZTECH Wire

Italy . 850 parts In-Stock

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850

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Kepictronics

USA . 8,000 parts In-Stock

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A-Z Elektronik GmbH

Germany . 7,385 parts In-Stock

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Perfect Parts

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Kulean Microsystems

USA . 5,155 parts In-Stock

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Problanco Electronics

Mexico . 4,540 parts In-Stock

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TANS Electronics

Latvia . 3,699 parts In-Stock

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SupplyDigital Components

Austria . 1,744 parts In-Stock

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Corphita

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Futuretech Components

Singapore . 500 parts In-Stock

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South Africa . 460 parts In-Stock

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Overview

Unleash the power of innovation with the NVD5806NT4G by Onsemi. As a leader in Power Field Effect Transistors, Onsemi delivers top-quality products that redefine industry standards. Ideal for switching applications, this N-channel transistor offers enhanced performance and durability. With a built-in diode and high operating temperature, the NVD5806NT4G provides superior functionality and reliability. Trust Onsemi to provide cutting-edge technology that exceeds expectations and maximizes efficiency. Elevate your electronic projects with the NVD5806NT4G and experience the difference today.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides durability and resistance to external elements, making the product suitable for various environments.

Polarity or Channel Type: N-CHANNEL

Offers high efficiency and low ON-resistance, making it ideal for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

Simplifies circuit design and reduces component count, providing cost-effective solutions.

Transistor Application: SWITCHING

Specifically designed for switching applications, ensuring optimal performance in power control systems.

Surface Mount: YES

Enables easy and convenient PCB mounting, saving space and simplifying assembly processes.

Minimum DS Breakdown Voltage: 40 V

Allows for operation in higher voltage applications, providing flexibility in design.

Maximum Pulsed Drain Current (IDM): 67 A

Capable of handling high current loads during peak operation, ensuring reliability under heavy loads.

Avalanche Energy Rating (EAS): 39 mJ

Provides robustness against avalanche breakdown, enhancing the device's ruggedness and reliability.

Maximum Drain Current (Abs) (ID): 33 A

Sufficient current handling capacity for various power applications, ensuring stable and consistent performance.

Maximum Power Dissipation (Abs): 40 W

Can dissipate significant amounts of power without overheating, ensuring long-term reliability.

Maximum Operating Temperature: 175 °C

Capable of operating at high temperatures, suitable for demanding industrial and automotive applications.

Maximum Drain-Source On Resistance: 0.019 ohm

Low ON-resistance results in minimal power loss and efficient conduction, improving overall power efficiency.

Technical Specifications

Power Field Effect Transistors (FET) NVD5806NT4G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

39 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

40 V

Maximum Drain Current (Abs) (ID):

33 A

Maximum Drain Current (ID):

33 A

Maximum Drain-Source On Resistance:

.019 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

67 A

Reference Standard:

AEC-Q101

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NVD5806NT4G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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