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NTD18N06G

Onsemi

NTD18N06G by Onsemi

NTD18N06G by Onsemi is a Power FET with 60V DS Breakdown Voltage, 18A Drain Current, and 0.06 ohm On Resistance. Ideal for SWITCHING applications, this N-CHANNEL transistor operates in ENHANCEMENT MODE with a max power dissipation of 1.5W in a small outline package style.

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Vyrian

USA . 1,973 parts In-Stock

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Digiode

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AZTECH Wire

Italy . 1,163 parts In-Stock

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Metaverse IC Inc.

Canada . 38,652 parts In-Stock

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Kepictronics

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Problanco Electronics

Mexico . 5,965 parts In-Stock

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Kulean Microsystems

USA . 3,033 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 2,291 parts In-Stock

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TANS Electronics

Latvia . 2,096 parts In-Stock

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UHIMA Technologies

Türkiye . 881 parts In-Stock

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Corphita

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SupplyDigital Components

Austria . 445 parts In-Stock

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Corohmni

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Overview

Unleash the power of innovation with the NTD18N06G by Onsemi. As a leading manufacturer in Power Field Effect Transistors (FET), Onsemi delivers unparalleled quality and reliability in every product. Ideal for switching applications, this N-CHANNEL transistor offers enhanced performance with a built-in diode. With a maximum pulsing drain current of 54A and a low on-resistance of 0.06 ohm, customers can trust in the efficiency and durability of this transistor. Trust Onsemi to provide cutting-edge technology that meets your needs and exceeds your expectations.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and protects the internal components, making the transistor suitable for a variety of environments.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have better performance and lower on-resistance compared to P-channel transistors, making this FET a good choice for efficient switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for easier circuit designs and protects against reverse current flow, improving overall reliability.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET can handle high currents efficiently and reliably.

Surface Mount: YES

Surface mount technology allows for easy and compact integration onto PCBs, saving space and improving overall system design.

Minimum DS Breakdown Voltage: 60 V

With a high breakdown voltage, this FET can handle higher voltage applications without risk of damage or failure.

Maximum Pulsed Drain Current (IDM): 54 A

High pulsed drain current rating ensures the FET can handle temporary high current spikes without overheating or failure.

Avalanche Energy Rating (EAS): 72 mJ

Higher avalanche energy rating indicates the FET can handle energy spikes and transients, improving overall robustness.

Maximum Drain-Source On Resistance: 0.06 ohm

Low on-resistance results in lower power dissipation and heat generation, making the FET efficient for switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD18N06G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

72 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

60 V

Maximum Drain Current (Abs) (ID):

18 A

Maximum Drain Current (ID):

18 A

Maximum Drain-Source On Resistance:

.06 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

54 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD18N06G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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