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NTD110N02R-1

Onsemi

NTD110N02R-1 by Onsemi

NTD110N02R-1 by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a 24V DS Breakdown Voltage, 110A IDM, and 0.0062 ohm RDS(on). The transistor operates in ENHANCEMENT MODE and has a max power dissipation of 92.5W at 150 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

2

In-Stock Inventory

1k+

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Digiode

USA . 2,416 parts In-Stock

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Vyrian

USA . 2,376 parts In-Stock

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SupplyDigital Components

Austria . 7,539 parts In-Stock

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Problanco Electronics

Mexico . 6,578 parts In-Stock

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Kulean Microsystems

USA . 4,493 parts In-Stock

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Corphita

USA . 530 parts In-Stock

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TANS Electronics

Latvia . 448 parts In-Stock

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UHIMA Technologies

Türkiye . 364 parts In-Stock

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Corohmni

South Africa . 348 parts In-Stock

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Overview

Discover the unparalleled reliability and performance of the NTD110N02R-1 Power Field Effect Transistor by Onsemi. As a leading manufacturer in the industry, Onsemi delivers top-notch quality and cutting-edge technology in every product. This N-channel transistor with a built-in diode is ideal for various switching applications, providing exceptional value and benefits to customers seeking enhanced efficiency and functionality. Upgrade your projects with the NTD110N02R-1 and experience the advantage of superior power management and seamless operation.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection for the transistor, making it suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have better performance and efficiency compared to P-channel FETs, making this product a good choice for high-performance applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and saves space, making this FET a convenient choice for switching applications.

Minimum DS Breakdown Voltage: 24 V

With a high breakdown voltage, this FET can handle higher voltages without damage, making it ideal for robust applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers fast and efficient switching capabilities.

Maximum Pulsed Drain Current (IDM): 110 A

The high pulsed drain current rating allows this FET to handle short-duration high-current pulses, making it suitable for high-power applications.

Avalanche Energy Rating (EAS): 120 mJ

The high avalanche energy rating indicates that this FET can withstand high-energy spikes, improving reliability in harsh operating conditions.

Maximum Power Dissipation (Abs): 92.5 W

With a high power dissipation rating, this FET can handle significant power levels and operate reliably in high-power applications.

Maximum Drain-Source On Resistance: 0.0062 ohm

The low on-resistance of this FET results in minimal power loss and improved efficiency in switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD110N02R-1 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

120 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

24 V

Maximum Drain Current (Abs) (ID):

32 A

Maximum Drain Current (ID):

32 A

Maximum Drain-Source On Resistance:

.0062 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSIP-T3

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

3

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

IN-LINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

110 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

NO

Terminal Finish:

TIN LEAD

Terminal Form:

THROUGH-HOLE

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD110N02R-1 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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