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NTD12N08L

Onsemi

NTD12N08L by Onsemi

NTD12N08L by Onsemi is a single N-channel power FET with 80V DS breakdown voltage and 0.18 ohm max RDS(on). Ideal for switching applications, it features a small outline package, Gull Wing terminals, and operates in enhancement mode.

Median Price

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Lifecycle Status

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2

In-Stock Inventory

1k+

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Vyrian

USA . 1,790 parts In-Stock

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Digiode

USA . 972 parts In-Stock

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972

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SupplyDigital Components

Austria . 4,542 parts In-Stock

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Problanco Electronics

Mexico . 4,515 parts In-Stock

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Kulean Microsystems

USA . 2,627 parts In-Stock

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TANS Electronics

Latvia . 2,325 parts In-Stock

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UHIMA Technologies

Türkiye . 614 parts In-Stock

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Corphita

USA . 508 parts In-Stock

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Corohmni

South Africa . 127 parts In-Stock

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Overview

Experience superior performance and reliability with the NTD12N08L Power FET by Onsemi. Known for their high-quality products, Onsemi delivers cutting-edge technology that guarantees seamless operation in various applications. This N-Channel transistor is perfect for switching applications, offering enhanced efficiency and durability. With a minimum DS breakdown voltage of 80V and a maximum drain-source on resistance of 0.18 ohm, this transistor ensures optimal performance. Say goodbye to power disruptions and hello to uninterrupted functionality with the NTD12N08L by Onsemi.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

Provides good insulation for the FET, ensuring safety and reliability in operation.

Polarity or Channel Type: N-CHANNEL

N-Channel FETs typically have lower on-state resistance and higher switching speeds compared to P-Channel FETs, making them ideal for many applications.

Configuration: SINGLE

Simplifies circuit design and operation as only one FET is needed for the application.

Transistor Application: SWITCHING

Designed specifically for switching applications, providing efficient and fast switching performance.

Surface Mount: YES

Allows for easy and compact mounting on a PCB, saving space and simplifying assembly.

Minimum DS Breakdown Voltage: 80 V

With a high breakdown voltage, this FET can handle higher voltages, making it suitable for a wide range of applications.

Package Shape: RECTANGULAR

The rectangular shape allows for easy placement and arrangement on a PCB for efficient circuit design.

Terminal Form: GULL WING

Gull wing terminals provide strong mechanical support and reliable connections, ensuring stable operation.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer high input impedance and fast switching characteristics, making them suitable for various high-speed switching applications.

No. of Terminals: 2

Having only two terminals simplifies circuit connections and reduces complexity in design.

Package Style (Meter): SMALL OUTLINE

Small outline package style saves space on the PCB and allows for compact circuit design.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high efficiency and reliability in performance.

Transistor Element Material: SILICON

Silicon-based FETs are widely used for their superior performance and reliability in various applications.

Terminal Finish: TIN LEAD

Tin lead finish provides good solderability and reliability in connections during assembly.

Maximum Drain-Source On Resistance: 0.18 ohm

Low on-resistance minimizes power losses and ensures efficient operation in switching applications.

Terminal Position: SINGLE

Single terminal position simplifies circuit connections and layout on the PCB.

Case Connection: DRAIN

Drain connection allows for efficient dissipation of heat generated during operation, ensuring reliable performance.

Technical Specifications

Power Field Effect Transistors (FET) NTD12N08L attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Configuration:

Minimum DS Breakdown Voltage:

80 V

Maximum Drain-Source On Resistance:

.18 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD12N08L Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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