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NTD12N10G

Onsemi

NTD12N10G by Onsemi

NTD12N10G by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a 100V DS Breakdown Voltage, 36A IDM, and 0.165 ohm Drain-Source Resistance. The transistor operates in ENHANCEMENT MODE with a max power dissipation of 56.6W at 175 °C temperature.

Median Price

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Lifecycle Status

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4

In-Stock Inventory

1k+

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Chip Stock

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Digiode

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France . 1 parts In-Stock

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AZTECH Wire

Italy . 876 parts In-Stock

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Kepictronics

USA . 20,000 parts In-Stock

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RC Electronics

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Kulean Microsystems

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TANS Electronics

Latvia . 3,891 parts In-Stock

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Problanco Electronics

Mexico . 2,498 parts In-Stock

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Corphita

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SupplyDigital Components

Austria . 404 parts In-Stock

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Overview

Elevate your power management solutions with the NTD12N10G by Onsemi. Crafted with precision and expertise, this N-CHANNEL Power FET offers unparalleled performance in switching applications. With a robust design and built-in diode, this transistor ensures reliability and efficiency in operation. Ideal for a variety of industries, this product promises seamless integration and optimal power distribution. Experience the value and benefits of Onsemi's cutting-edge technology with the NTD12N10G. Unlock new possibilities and elevate your projects with this high-quality, innovative solution.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides good insulation for the transistor and protects it from environmental factors, making it durable and long-lasting.

Polarity or Channel Type: N-CHANNEL

N-channel transistors typically have lower ON-state resistance and higher current capabilities, making them efficient for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode allows for more efficient switching and protection against reverse voltage, making this transistor suitable for diverse applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this transistor offers reliable performance and high efficiency in controlling electrical signals.

Surface Mount: YES

Surface mount technology allows for easy placement on circuit boards, saving space and simplifying the manufacturing process.

Minimum DS Breakdown Voltage: 100 V

With a high breakdown voltage, this transistor can handle high voltages without breakdown, ensuring reliable operation in various applications.

Maximum Power Dissipation (Abs): 56.6 W

The high power dissipation rating ensures that this transistor can handle high power loads without overheating, making it a reliable choice for demanding applications.

Maximum Operating Temperature: 175 °C

With a high maximum operating temperature, this transistor can function in hot environments without performance degradation, increasing its versatility.

Technical Specifications

Power Field Effect Transistors (FET) NTD12N10G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

75 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.165 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

NOT SPECIFIED

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

36 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

NOT SPECIFIED

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD12N10G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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