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NTD12N10T4

Onsemi

NTD12N10T4 by Onsemi

NTD12N10T4 by Onsemi is a Power FET with 100V DS Breakdown Voltage, 36A IDM, and 0.165 ohm RDS(on). Ideal for SWITCHING applications in ENHANCEMENT MODE, this N-CHANNEL transistor features a built-in DIODE and operates at up to 175 °C.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

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Chip Stock

USA . 62,000 parts In-Stock

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Digiode

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AZTECH Wire

Italy . 107 parts In-Stock

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Component Stockers USA

USA . 735 parts In-Stock

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$99.990

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Kepictronics

USA . 20,000 parts In-Stock

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TANS Electronics

Latvia . 6,675 parts In-Stock

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Kulean Microsystems

USA . 5,761 parts In-Stock

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Problanco Electronics

Mexico . 4,310 parts In-Stock

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SupplyDigital Components

Austria . 2,900 parts In-Stock

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Corphita

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UHIMA Technologies

Türkiye . 467 parts In-Stock

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Corohmni

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Overview

Unlock unparalleled performance and reliability with the Onsemi NTD12N10T4 Power Field Effect Transistor. Manufactured by industry leader Onsemi, this N-channel transistor offers enhanced switching capabilities, making it ideal for a variety of applications. With a high DS breakdown voltage of 100V and maximum drain current of 12A, this transistor delivers exceptional power dissipation and efficiency. Say goodbye to performance limitations and hello to seamless operation with the NTD12N10T4.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy as the package body material makes the product lightweight and durable, suitable for various applications.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have better performance and lower conduction losses compared to P-channel FETs, making them a popular choice for switching applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and offers protection against voltage spikes and reverse polarity, making the product more reliable in switching applications.

Transistor Application: SWITCHING

Designed specifically for switching applications, this FET offers high efficiency and fast response, making it ideal for power management in various electronic devices.

Surface Mount: YES

Being surface mountable allows for easy and efficient PCB assembly, saving space and enabling high-density designs for modern electronic devices.

Minimum DS Breakdown Voltage: 100 V

The high breakdown voltage ensures reliable operation and protection against voltage spikes, making the FET suitable for high-power applications.

Maximum Pulsed Drain Current (IDM): 36 A

With a high pulsed drain current rating, this FET can handle short-term overload conditions without sacrificing performance, ensuring robust operation in demanding environments.

Maximum Power Dissipation (Abs): 56.6 W

The high power dissipation capability allows the FET to handle significant power levels without overheating, ensuring long-term reliability in various applications.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers high efficiency, low power consumption, and fast switching speeds, making it ideal for power management in modern electronic devices.

Maximum Operating Temperature: 175 °C

With a high maximum operating temperature, this FET can operate reliably in elevated ambient temperatures without derating, ideal for industrial and automotive applications.

Maximum Drain-Source On Resistance: 0.165 ohm

The low on-resistance of the FET results in reduced conduction losses and improved efficiency, making it an excellent choice for high-speed switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NTD12N10T4 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

75 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

100 V

Maximum Drain Current (Abs) (ID):

12 A

Maximum Drain Current (ID):

12 A

Maximum Drain-Source On Resistance:

.165 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e0

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

235

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

36 A

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NTD12N10T4 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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