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PD57060

STMicroelectronics

PD57060 by STMicroelectronics

PD57060 by STMicroelectronics is an N-channel RF power FET designed for amplifier applications. It features a max drain current of 7 A, a breakdown voltage of 65 V, and operates in the ultra-high frequency band. Its compact surface mount design ensures efficient performance in various electronic devices.

Median Price

-

Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

Distributors (In-Stock)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Digiode

USA . 4,233 parts In-Stock

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4,233

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Vyrian

USA . 2,571 parts In-Stock

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2,571

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Anansix

USA . 1,997 parts In-Stock

1+ parts

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1,997

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Distributors (Availability)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

IDEA Electronic Components Group

UK . 1,499 parts In-Stock

1+ parts

$1.303

100+ parts

-

1k+ parts

$1.172

10k+ parts

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1,499

$1.303

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$1.172

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MKK Technologies

India . 1,796 parts In-Stock

1+ parts

$2.450

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1,796

$2.450

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DigiPath Technology Company

USA . 1,796 parts In-Stock

1+ parts

$2.450

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1,796

$2.450

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Corphita

USA . 4,554 parts In-Stock

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4,554

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Parana Technologies

USA . 373 parts In-Stock

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100+ parts

$1.558

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373

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$1.558

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Overview

Unlock superior performance with the PD57060 by STMicroelectronics, an N-channel RF Power FET designed for amplification in ultra-high frequency applications. Renowned for its exceptional quality and reliability, STMicroelectronics delivers a transistor that excels in power handling and efficiency. Ideal for both emerging technologies and established systems, this compact powerhouse offers customers unmatched versatility and long-lasting value, ensuring your projects achieve optimal results with every use.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides a robust, lightweight, and cost-effective solution for housing the transistor.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically have higher electron mobility, allowing for improved performance in power applications.

Configuration: SINGLE

A single configuration simplifies the design and integration into circuits, making it suitable for a variety of applications.

Transistor Application: AMPLIFIER

This specification indicates the device's capability for signal amplification, crucial for audio and RF applications.

Surface Mount: YES

Surface mount technology enables compact designs and automated assembly processes, enhancing production efficiency.

Minimum DS Breakdown Voltage: 65 V

A high breakdown voltage ensures reliability and performance under varying voltage conditions, making it suitable for demanding applications.

Package Shape: RECTANGULAR

Rectangular packaging facilitates efficient space utilization on PCBs, allowing for more compact designs.

Terminal Form: GULL WING

Gull wing leads provide excellent soldering and accessibility, ensuring reliable connections to the PCB.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs provide better control and lower power loss, making them efficient for amplifier applications.

Highest Frequency Band: ULTRA HIGH FREQUENCY BAND

This capability allows for applications in high-frequency communications, making it ideal for RF applications.

Maximum Drain Current (Abs) (ID): 7 A

The high drain current rating allows the transistor to handle significant power levels, suitable for high-performance applications.

No. of Terminals: 2

A simple two-terminal design reduces complexity and is easier to integrate into various circuits.

Maximum Power Dissipation (Abs): 79 W

The ability to dissipate high power ensures the transistor can handle demanding workloads without overheating.

Package Style (Meter): SMALL OUTLINE

Small outline packaging saves valuable board space while providing effective thermal management.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

MOS technology offers high input impedance and low power consumption, enhancing performance in amplifier circuits.

Maximum Operating Temperature: 165 °C

A high operating temperature rating improves reliability in harsh environments and extends the device's lifespan.

Transistor Element Material: SILICON

Silicon is a well-established semiconductor material that ensures effective performance and durability.

Terminal Finish: TIN LEAD

Tin lead finish enhances solderability, ensuring strong and reliable electrical connections.

Maximum Drain Current (ID): 7 A

The capability to handle up to 7 A makes this FET suitable for high-power applications, ensuring versatility.

Terminal Position: DUAL

Dual terminal positioning enhances accessibility for mounting and connections, facilitating easier circuit integration.

Case Connection: SOURCE

A source connection directly simplifies circuit configurations and enhances the ease of integration into designs.

Technical Specifications

RF Power Field Effect Transistors (FET) PD57060 attributes and parameters. Explore more RF Power Field Effect Transistors (FET) devices from STMicroelectronics

Specs

Additional Features:

HIGH RELIABILITY

Case Connection:

SOURCE

Configuration:

Minimum DS Breakdown Voltage:

65 V

Maximum Drain Current (Abs) (ID):

7 A

Maximum Drain Current (ID):

7 A

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Highest Frequency Band:

ULTRA HIGH FREQUENCY BAND

JESD-30 Code:

R-PDSO-G2

JESD-609 Code:

e0

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

165 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Qualification:

Not Qualified

Sub-Category:

FET General Purpose Power

Surface Mount:

YES

Terminal Finish:

TIN LEAD

Terminal Form:

GULL WING

Terminal Position:

DUAL

Transistor Application:

AMPLIFIER

Transistor Element Material:

SILICON

Trade Compliance

PD57060 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

STMicroelectronics

STMicroelectronics is a global leader in the semiconductor manufacturing industry, with over 35 years of experience providing innovative and advanced technologies for customers around the world. Headquartered in Netherlands, STMicroelectronics has more than 51,323 employees worldwide and operates across 32 countries all over Europe, Asia-Pacific and the Americas. The company’s portfolio includes integrated circuits, discrete components, application-specific standard products, and computer chipsets. STMicroelectronics serves a wide range of industries such as automotive, consumer markets, healthcare and industrial applications.

Management team

President, CEO

Jean-Marc Chery

President, CFO, Finance, Purchasing,Enterprise Risk Management & Resilience

Lorenzo Grandi

President, Sales & Marketing

Jerome Roux

Manufacturer fab locations 33

Fab name Location Fab Initiation Wafer Capacity

Castelletto

Fabrication

Fab Initiation

1968

Italy

Castelletto

Wafer Capacity

1968

SGFAB AMK 6

Fabrication

Fab Initiation

2000

Singapore

Singapore

Wafer Capacity

29,000

2000

29,000

AG200

Fabrication

Fab Initiation

2000

Italy

Agrate Brianza

Wafer Capacity

14,000

2000

14,000

RST 8

Fabrication

Fab Initiation

2000

France

Rousset

Wafer Capacity

35,000

2000

35,000

Crolles 1

Fabrication

Fab Initiation

1993

France

Crolles

Wafer Capacity

30,000

1993

30,000

Crolles 2-ext. mod 5

Fabrication

Fab Initiation

-

France

Crolles

Wafer Capacity

-

Crolles 2-ext. mod 2

Fabrication

Fab Initiation

2022

France

Crolles

Wafer Capacity

2022

Crolles 2-ext. mod 3

Fabrication

Fab Initiation

2023

France

Crolles

Wafer Capacity

2023

Crolles 2

Fabrication

Fab Initiation

2004

France

Crolles

Wafer Capacity

28,000

2004

28,000

AG200

Fabrication

Fab Initiation

1985

Italy

Agrate Brianza

Wafer Capacity

14,000

1985

14,000

SiC Fab

Fabrication

Fab Initiation

2006

Sweden

Norrköping

Wafer Capacity

10,000

2006

10,000

Fab 3

Fabrication

Fab Initiation

2005

France

Tours

Wafer Capacity

2,000

2005

2,000

Fab 1 & Fab 2

Fabrication

Fab Initiation

1978

France

Tours

Wafer Capacity

55,000

1978

55,000

Fab 2

Fabrication

Fab Initiation

1997

Italy

Catania

Wafer Capacity

30,000

1997

30,000

SGFAB-AMK 6E

Fabrication

Fab Initiation

2003

Singapore

Singapore

Wafer Capacity

145,000

2003

145,000

SGFAB-AMJ 9

Fabrication

Fab Initiation

1984

Singapore

Singapore

Wafer Capacity

152,000

1984

152,000

AG300 (R3)

Fabrication

Fab Initiation

2022

Italy

Agrate Brianza

Wafer Capacity

2022

Fab 2

Fabrication

Fab Initiation

1980

Italy

Catania

Wafer Capacity

25,000

1980

25,000

AG200

Fabrication

Fab Initiation

1987

Italy

Agrate Brianza

Wafer Capacity

34,000

1987

34,000

AG300

Fabrication

Fab Initiation

2024

Italy

Agrate Brianza

Wafer Capacity

2024

Crolles 2-ext. mod 1

Fabrication

Fab Initiation

2020

France

Crolles

Wafer Capacity

2,000

2020

2,000

Fab 1 6-inch fab

Fabrication

Fab Initiation

2013

Italy

Catania

Wafer Capacity

11,000

2013

11,000

SiC 6-inch line

Fabrication

Fab Initiation

2021

Singapore

Singapore

Wafer Capacity

2021

Fab 1 6-inch fab

Fabrication

Fab Initiation

2020

Italy

Catania

Wafer Capacity

2,500

2020

2,500

200mm GaN

Fabrication

Fab Initiation

2021

France

Tours

Wafer Capacity

2,500

2021

2,500

Fab 2

Fabrication

Fab Initiation

2018

Italy

Catania

Wafer Capacity

14,000

2018

14,000

SGFAB-AMK 8

Fabrication

Fab Initiation

2001

Singapore

Singapore

Wafer Capacity

30,000

2001

30,000

Crolles 2- JV Fab

Fabrication

Fab Initiation

2024

France

Crolles

Wafer Capacity

2024

SGFAB-AMK 6

Fabrication

Fab Initiation

2016

Singapore

Singapore

Wafer Capacity

38,125

2016

38,125

SGFAB-AMK 2E

Fabrication

Fab Initiation

2010

Singapore

Singapore

Wafer Capacity

20,000

2010

20,000

Silicon Carbide A.B.

Fabrication

Fab Initiation

2021

Sweden

Norrköping

Wafer Capacity

2021

SiC wafer/EPI Fab

Fabrication

Fab Initiation

2023

Italy

Catania

Wafer Capacity

2023

SiC Device Fab

Fabrication

Fab Initiation

2025

Italy

Catania

Wafer Capacity

2025

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