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NVTYS002N03CLTWG

Onsemi

NVTYS002N03CLTWG by Onsemi

NVTYS002N03CLTWG by Onsemi is a Power FET with N-CHANNEL polarity, 30V DS Breakdown Voltage, and 675A IDM. Ideal for applications requiring high power dissipation up to 75W in enhancement mode operation. Features include a built-in diode, avalanche energy rating of 320mJ, and AEC-Q101 compliance for automotive use.

Median Price

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Lifecycle Status

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3

In-Stock Inventory

1k+

Distributors (In-Stock)

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Vyrian

USA . 6,079 parts In-Stock

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Flip Electronics

USA . 2,274 parts In-Stock

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Digiode

USA . 1,556 parts In-Stock

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Microchip USA

USA . 4,708 parts In-Stock

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$5.378

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AZTECH Wire

Italy . 862 parts In-Stock

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iodParts Technologies Inc.

India . 200,000 parts In-Stock

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TANS Electronics

Latvia . 5,344 parts In-Stock

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Kulean Microsystems

USA . 4,930 parts In-Stock

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SupplyDigital Components

Austria . 3,962 parts In-Stock

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Authorized Procurement Solutions

USA . 3,000 parts In-Stock

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Corphita

USA . 972 parts In-Stock

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Problanco Electronics

Mexico . 965 parts In-Stock

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UHIMA Technologies

Türkiye . 428 parts In-Stock

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Corohmni

South Africa . 333 parts In-Stock

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Overview

Discover the power and efficiency of the NVTYS002N03CLTWG by Onsemi, a top-of-the-line Power Field Effect Transistor designed to enhance your electronic projects. With its high-quality construction and cutting-edge technology, this N-channel FET offers reliable performance and durability. Whether you're working on automotive applications, industrial machinery, or consumer electronics, this product delivers maximum power dissipation and efficient operation. Trust Onsemi's reputation for excellence and experience the value this transistor brings to your designs. Upgrade your projects with the NVTYS002N03CLTWG today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material of the package body provides durability and protection for the internal components, making the FET suitable for various operating conditions.

Polarity or Channel Type: N-CHANNEL

N-channel FETs typically offer higher mobility and efficiency, making them ideal for high-performance applications.

Operating Mode: ENHANCEMENT MODE

Enhancement mode FETs offer easy control and high-speed switching capabilities, making them suitable for a wide range of applications.

Maximum Pulsed Drain Current (IDM): 675 A

The high maximum pulsed drain current rating allows the FET to handle high-power applications and transient loads effectively.

Maximum Power Dissipation (Abs): 75 W

The high maximum power dissipation rating ensures the FET can operate reliably under heavy load conditions without overheating.

Maximum Operating Temperature: 175 °C

The high maximum operating temperature rating allows the FET to be used in a wide range of temperature environments without performance degradation.

Technical Specifications

Power Field Effect Transistors (FET) NVTYS002N03CLTWG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

320 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (ID):

29 A

Maximum Drain-Source On Resistance:

.0031 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

43 pF

JESD-30 Code:

R-PDSO-X8

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

8

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation Ambient:

3.2 W

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

675 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

UNSPECIFIED

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Trade Compliance

NVTYS002N03CLTWG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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