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NVMYS013N08LHTWG

Onsemi

NVMYS013N08LHTWG by Onsemi

NVMYS013N08LHTWG by Onsemi is a N-CHANNEL FET with 80V DS Breakdown Voltage, ideal for SWITCHING applications. Features include 208A IDM, 207mJ EAS, and 0.0131 ohm RDS(on). Operating from -55 to 175 °C, it has a small outline package with GULL WING terminals.

Median Price

$1.558

Lifecycle Status

Suppliers In-Stock

4

In-Stock Inventory

1k+

Distributors (Authorized)

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Flip Electronics (Authorized)

USA . 18,000 parts In-Stock

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Digiode

USA . 1,202 parts In-Stock

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Flip Electronics

USA . 18,000 parts In-Stock

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Vyrian

USA . 12,674 parts In-Stock

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Component Stockers USA

USA . 3,468 parts In-Stock

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$1.080

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$0.680

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$0.470

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Corphita

USA . 1,586 parts In-Stock

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$1.476

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Corohmni

South Africa . 226 parts In-Stock

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$1.640

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226

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Microchip USA

USA . 7,129 parts In-Stock

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$4.374

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Problanco Electronics

Mexico . 7,526 parts In-Stock

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SupplyDigital Components

Austria . 5,076 parts In-Stock

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TANS Electronics

Latvia . 3,478 parts In-Stock

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Kulean Microsystems

USA . 3,402 parts In-Stock

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Authorized Procurement Solutions

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UHIMA Technologies

Türkiye . 575 parts In-Stock

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Overview

Discover the power of the NVMYS013N08LHTWG by Onsemi, a top-tier manufacturer known for delivering high-quality Power Field Effect Transistors (FET). Ideal for switching applications, this single-channel transistor with a built-in diode offers unparalleled performance and reliability. With a maximum pulsed drain current of 208A and a minimum DS breakdown voltage of 80V, this transistor ensures efficient operation in a wide range of scenarios. Whether you're looking to enhance your electronic devices or optimize your power management systems, the NVMYS013N08LHTWG provides the value, benefits, and advantages that customers seek. Elevate your projects with this innovative solution today!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

This material provides durability and protection to the internal components, ensuring a longer lifespan for the product.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode simplifies circuit design and can provide protection against reverse voltage spikes.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring efficient and reliable performance in power control circuits.

Surface Mount: YES

Suitable for automated assembly processes, saving time and labor costs during manufacturing.

Minimum DS Breakdown Voltage: 80 V

With a high breakdown voltage, this FET can handle high voltage applications, providing a wide range of potential uses.

Terminal Form: GULL WING

The gull wing terminal form is well-suited for surface mount applications, providing secure connections to the circuit board.

Maximum Pulsed Drain Current (IDM): 208 A

Capable of handling high peak currents, making it suitable for applications where brief high-current pulses are required.

Maximum Power Dissipation (Abs): 54 W

With a high power dissipation rating, this FET can handle significant power loads, making it suitable for high-power applications.

Maximum Operating Temperature: 175 °C

Can operate at high temperatures without performance degradation, suitable for applications where heat dissipation is a concern.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

This technology offers high switching speeds and low on-resistance, making it ideal for power switching applications.

Technical Specifications

Power Field Effect Transistors (FET) NVMYS013N08LHTWG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

207 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

80 V

Maximum Drain Current (Abs) (ID):

42 A

Maximum Drain Current (ID):

42 A

Maximum Drain-Source On Resistance:

.0131 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G4

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

208 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NVMYS013N08LHTWG Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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