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NVMYS008N08LHTWG

Onsemi

NVMYS008N08LHTWG by Onsemi

NVMYS008N08LHTWG by Onsemi is a Power FET with 80V DS Breakdown Voltage, 319A IDM, and 0.011 ohm RDS(on). Ideal for automotive applications due to AEC-Q101 compliance. Single N-Channel MOSFET in a small outline package with built-in diode for enhanced performance.

Median Price

$1.950

Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

DigiKey

USA . 2,925 parts In-Stock

1+ parts

$1.950

100+ parts

$0.840

1k+ parts

$0.622

10k+ parts

$0.508

2,925

$1.950

$0.840

$0.622

$0.508

Flip Electronics (Authorized)

USA . 24,000 parts In-Stock

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24,000

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Digiode

USA . 536 parts In-Stock

1+ parts

$1.805

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536

$1.805

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Vyrian

USA . 813 parts In-Stock

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$1.900

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813

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Flip Electronics

USA . 35,865 parts In-Stock

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Corphita

USA . 1,725 parts In-Stock

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$1.710

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$1.710

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Corohmni

South Africa . 226 parts In-Stock

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$1.900

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226

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Microchip USA

USA . 5,814 parts In-Stock

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$4.681

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$4.681

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Kulean Microsystems

USA . 5,129 parts In-Stock

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5,129

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TANS Electronics

Latvia . 4,121 parts In-Stock

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SupplyDigital Components

Austria . 2,940 parts In-Stock

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Problanco Electronics

Mexico . 766 parts In-Stock

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UHIMA Technologies

Türkiye . 67 parts In-Stock

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Overview

Unleash the power of your applications with the NVMYS008N08LHTWG Power FET from Onsemi. Manufactured with top-notch quality and expertise, this N-CHANNEL FET offers unparalleled performance and reliability. Whether you're in automotive, industrial, or consumer electronics, this single configuration with built-in diode is a game-changer. With a maximum drain current of 59A and a low on-resistance of 0.011 ohm, this FET delivers superior efficiency and power handling capabilities. Trust Onsemi to take your projects to the next level with the NVMYS008N08LHTWG.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy packaging offers good protection for the FET, making it durable and reliable for long-term use.

Polarity or Channel Type: N-CHANNEL

N-channel FETs generally have lower on-resistance and higher conductivity, making them efficient for power applications.

Configuration: SINGLE WITH BUILT-IN DIODE

The built-in diode enhances the versatility of the FET, allowing for simpler circuit designs and better protection against reverse voltage.

Surface Mount: YES

Surface mount technology facilitates easy and efficient assembly onto PCBs, saving space and streamlining production processes.

Minimum DS Breakdown Voltage: 80 V

The high breakdown voltage ensures reliable performance and protection against overvoltage conditions.

Maximum Pulsed Drain Current (IDM): 319 A

The high pulsed drain current rating allows for handling sudden spikes in current, ideal for power applications with variable loads.

Maximum Power Dissipation (Abs): 73 W

With a high power dissipation rating, this FET can handle significant power levels without overheating, ensuring stable operation.

Maximum Operating Temperature: 175 °C

The high operating temperature range allows for use in harsh environments or applications where heat dissipation is a concern.

Technical Specifications

Power Field Effect Transistors (FET) NVMYS008N08LHTWG attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

267 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

80 V

Maximum Drain Current (Abs) (ID):

59 A

Maximum Drain Current (ID):

59 A

Maximum Drain-Source On Resistance:

.011 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

11 pF

JESD-30 Code:

R-PSSO-G4

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

4

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

319 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Element Material:

SILICON

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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