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NVD4810NT4G-VF01

Onsemi

NVD4810NT4G-VF01 by Onsemi

NVD4810NT4G-VF01 by Onsemi is a Power FET with 30V DS Breakdown Voltage, 120A IDM, and 0.0157 ohm RDS(on). Ideal for SWITCHING applications, it operates in ENHANCEMENT MODE with a max power dissipation of 50W. AEC-Q101 compliant, this N-CHANNEL FET has a temperature range from -55 to 175 °C.

Median Price

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Lifecycle Status

Suppliers In-Stock

3

In-Stock Inventory

1k+

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ComSIT Distribution GmbH

Germany . 50,000 parts In-Stock

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Vyrian

USA . 7,170 parts In-Stock

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Digiode

USA . 698 parts In-Stock

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AZTECH Wire

Italy . 1,119 parts In-Stock

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$21.830

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Component Stockers USA

USA . 529 parts In-Stock

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$99.990

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529

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Problanco Electronics

Mexico . 8,206 parts In-Stock

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Kulean Microsystems

USA . 2,282 parts In-Stock

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SupplyDigital Components

Austria . 1,491 parts In-Stock

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Corphita

USA . 1,053 parts In-Stock

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TANS Electronics

Latvia . 623 parts In-Stock

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UHIMA Technologies

Türkiye . 536 parts In-Stock

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Corohmni

South Africa . 431 parts In-Stock

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Overview

Discover the unparalleled performance of the NVD4810NT4G-VF01 by Onsemi, a top-tier manufacturer known for quality and reliability. This Power FET boasts a single configuration with a built-in diode, making it ideal for switching applications. With a maximum pulsed drain current of 120A and a minimum DS breakdown voltage of 30V, this transistor delivers exceptional power and efficiency. Perfect for a wide range of electronic devices, the NVD4810NT4G-VF01 offers customers unbeatable value, benefits, and advantages that set it apart from the competition. Experience the difference with Onsemi's cutting-edge technology.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy for the package body material makes the transistor lightweight and durable, ideal for use in various applications.

Transistor Application: SWITCHING

With a specific application for switching, this FET is designed to efficiently control the flow of current, making it suitable for use in power management systems.

Operating Mode: ENHANCEMENT MODE

Being in enhancement mode means that this FET can be easily turned on and off, providing better control over the power flow in circuits.

Maximum Power Dissipation (Abs): 50 W

The high maximum power dissipation allows this FET to handle large amounts of power without overheating, ensuring reliable performance in demanding conditions.

Maximum Operating Temperature: 175 °C

With a high maximum operating temperature, this FET can operate efficiently in a wide range of environments, making it versatile and suitable for various applications.

Technical Specifications

Power Field Effect Transistors (FET) NVD4810NT4G-VF01 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

98 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

30 V

Maximum Drain Current (Abs) (ID):

45 A

Maximum Drain Current (ID):

9 A

Maximum Drain-Source On Resistance:

.0157 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

Maximum Feedback Capacitance (Crss):

200 pF

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

120 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NVD4810NT4G-VF01 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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