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NVD4856NT4G-VF01

Onsemi

NVD4856NT4G-VF01 by Onsemi

NVD4856NT4G-VF01 by Onsemi is a Power FET with N-CHANNEL polarity, suitable for SWITCHING applications. It features a Max Pulsed Drain Current of 179A, Avalanche Energy Rating of 180.5mJ, and Max Power Dissipation of 60W. Ideal for high-power switching circuits in automotive and industrial electronics due to its robust design and performance capabilities.

Median Price

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Lifecycle Status

Suppliers In-Stock

5

In-Stock Inventory

1k+

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Chip Stock

USA . 62,000 parts In-Stock

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Vyrian

USA . 12,656 parts In-Stock

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Bristol Electronics

USA . 2,466 parts In-Stock

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Dan-Mar Components

USA . 2,466 parts In-Stock

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Digiode

USA . 1,329 parts In-Stock

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AZTECH Wire

Italy . 194 parts In-Stock

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Kulean Microsystems

USA . 6,059 parts In-Stock

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Problanco Electronics

Mexico . 3,818 parts In-Stock

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TANS Electronics

Latvia . 2,516 parts In-Stock

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Corphita

USA . 1,271 parts In-Stock

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SupplyDigital Components

Austria . 1,154 parts In-Stock

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UHIMA Technologies

Türkiye . 458 parts In-Stock

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Corohmni

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Overview

Enhance the performance of your electronic devices with the NVD4856NT4G-VF01 Power FET by Onsemi. Known for their high-quality components, Onsemi delivers reliable and efficient products that cater to various applications in the industry. This N-CHANNEL FET with a built-in diode is perfect for switching applications, offering enhanced power management capabilities. With a maximum power dissipation of 60W and a low drain-source on resistance of 0.0068 ohm, this FET provides exceptional value and benefits to customers looking for top-notch performance and durability in their designs. Upgrade your electronics with the NVD4856NT4G-VF01 and experience the difference!

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The use of plastic/epoxy material makes the product durable and resistant to damage, ensuring a longer lifespan.

Polarity or Channel Type: N-CHANNEL

N-channel transistors generally have higher mobility and conductivity, providing better performance and efficiency.

Transistor Application: SWITCHING

Designed specifically for switching applications, ensuring fast and efficient operation in power management.

Surface Mount: YES

Being surface mountable allows for easy and convenient integration onto PCBs, saving space and facilitating automated assembly processes.

Minimum DS Breakdown Voltage: 25 V

This high minimum breakdown voltage provides a good margin of safety and reliability in voltage regulation applications.

Maximum Pulsed Drain Current (IDM): 179 A

The high maximum pulsed drain current allows the transistor to handle large current surges, making it suitable for high power applications.

Maximum Power Dissipation (Abs): 60 W

With a high maximum power dissipation, the transistor can handle large amounts of power without overheating, ensuring stable performance.

Maximum Operating Temperature: 175 °C

The high maximum operating temperature allows the transistor to function reliably in a wide range of environments, increasing its versatility.

Field Effect Transistor Technology: METAL-OXIDE SEMICONDUCTOR

Metal-oxide semiconductor technology offers low power consumption, high efficiency, and fast switching speeds, making the product energy-efficient.

Maximum Drain-Source On Resistance: 0.0068 ohm

The low maximum drain-source on resistance minimizes power loss and improves efficiency in switch mode operations.

Technical Specifications

Power Field Effect Transistors (FET) NVD4856NT4G-VF01 attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Avalanche Energy Rating (EAS):

180.5 mJ

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

25 V

Maximum Drain Current (Abs) (ID):

89 A

Maximum Drain Current (ID):

89 A

Maximum Drain-Source On Resistance:

.0068 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

R-PSSO-G2

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

1

No. of Terminals:

2

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

175 Cel

Minimum Operating Temperature:

-55 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

RECTANGULAR

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Power Dissipation (Abs):

Maximum Pulsed Drain Current (IDM):

179 A

Reference Standard:

AEC-Q101

Surface Mount:

YES

Terminal Finish:

MATTE TIN

Terminal Form:

GULL WING

Terminal Position:

SINGLE

Maximum Time At Peak Reflow Temperature (s):

30

Transistor Application:

SWITCHING

Transistor Element Material:

SILICON

Trade Compliance

NVD4856NT4G-VF01 Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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