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NTLGD3502NT2G

Onsemi

NTLGD3502NT2G by Onsemi

NTLGD3502NT2G by Onsemi is an N-CHANNEL FET with 20V DS Breakdown Voltage, 17.2A IDM, and 0.06 ohm RDS(ON). It is used in power applications requiring high drain current handling and low on-resistance.

Median Price

$0.576

Lifecycle Status

Suppliers In-Stock

8

In-Stock Inventory

1k+

Distributors (Authorized)

Supplier In-Stock 1+ parts 100+ parts 1k+ parts 10k+ parts

Rochester

USA . 99,000 parts In-Stock

1+ parts

-

100+ parts

$0.555

1k+ parts

$0.461

10k+ parts

$0.411

99,000

-

$0.555

$0.461

$0.411

DigiKey

USA . 99,000 parts In-Stock

1+ parts

-

100+ parts

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1k+ parts

$0.690

10k+ parts

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99,000

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-

$0.690

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Verical

USA . 96,000 parts In-Stock

1+ parts

-

100+ parts

-

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$0.576

10k+ parts

$0.513

96,000

-

-

$0.576

$0.513

Distributors (In-Stock)

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Digiode

USA . 1,652 parts In-Stock

1+ parts

$0.432

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1,652

$0.432

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Vyrian

USA . 1,496 parts In-Stock

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$0.455

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1,496

$0.455

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ACDS - Activité Composants Distribution Service

France . 2,979 parts In-Stock

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2,979

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Bristol Electronics

USA . 2,979 parts In-Stock

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$0.652

1k+ parts

$0.452

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2,979

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$0.652

$0.452

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Dan-Mar Components

USA . 2,979 parts In-Stock

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2,979

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Distributors (Availability)

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Corphita

USA . 1,750 parts In-Stock

1+ parts

$0.410

100+ parts

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1,750

$0.410

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Corohmni

South Africa . 361 parts In-Stock

1+ parts

$0.455

100+ parts

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361

$0.455

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Continental Prestige Electronics

USA . 99,000 parts In-Stock

1+ parts

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100+ parts

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$0.443

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99,000

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$0.443

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Metaverse IC Inc.

Canada . 29,000 parts In-Stock

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29,000

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SupplyDigital Components

Austria . 8,046 parts In-Stock

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8,046

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A-Z Elektronik GmbH

Germany . 7,113 parts In-Stock

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7,113

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TANS Electronics

Latvia . 5,901 parts In-Stock

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QUARKTWIN TECHNOLOGY LTD

USA . 5,211 parts In-Stock

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Authorized Procurement Solutions

USA . 5,000 parts In-Stock

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5,000

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Problanco Electronics

Mexico . 4,277 parts In-Stock

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4,277

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UHIMA Technologies

Türkiye . 582 parts In-Stock

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582

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Futuretech Components

Singapore . 508 parts In-Stock

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508

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Kulean Microsystems

USA . 217 parts In-Stock

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Overview

Unleash the power of innovation with the NTLGD3502NT2G by Onsemi, a top-tier manufacturer known for delivering premium quality products. As a part of the Power Field Effect Transistors category, this N-CHANNEL transistor offers exceptional performance and reliability. With a series configuration, built-in diode, and small outline package style, this transistor is ideal for a wide range of applications. Experience the benefits of enhanced efficiency, high pulsing capabilities, and superior temperature tolerance, making it the perfect choice for your next project. Elevate your designs with the NTLGD3502NT2G and unlock a world of possibilities.

Feature Benefit Bullets

Package Body Material: PLASTIC/EPOXY

The plastic/epoxy material provides durability and reliability to the product.

Configuration: SERIES, 2 ELEMENTS WITH BUILT-IN DIODE

This configuration allows for efficient power management with built-in diode for protection.

Minimum DS Breakdown Voltage: 20 V

With a minimum breakdown voltage of 20V, this FET can handle higher levels of power without damage.

Maximum Pulsed Drain Current (IDM): 17.2 A

The high maximum pulsed drain current makes this FET suitable for applications requiring brief surges of power.

Maximum Operating Temperature: 150 °C

The high maximum operating temperature of 150 °C ensures reliability in various operating conditions.

Maximum Drain-Source On Resistance: 0.06 ohm

The low drain-source on resistance of 0.06 ohm results in efficient power flow with minimal losses.

Technical Specifications

Power Field Effect Transistors (FET) NTLGD3502NT2G attributes and parameters. Explore more Power Field Effect Transistors (FET) devices from Onsemi

Specs

Case Connection:

DRAIN

Minimum DS Breakdown Voltage:

20 V

Maximum Drain Current (ID):

4.3 A

Maximum Drain-Source On Resistance:

.06 ohm

Field Effect Transistor Technology:

METAL-OXIDE SEMICONDUCTOR

JESD-30 Code:

S-PDSO-N6

JESD-609 Code:

e3

Moisture Sensitivity Level (MSL):

1

No. of Elements:

2

No. of Terminals:

6

Operating Mode:

ENHANCEMENT MODE

Maximum Operating Temperature:

150 Cel

Package Body Material:

PLASTIC/EPOXY

Package Shape:

SQUARE

Package Style (Meter):

SMALL OUTLINE

Peak Reflow Temperature (C):

260

Polarity or Channel Type:

Maximum Pulsed Drain Current (IDM):

17.2 A

Qualification:

Not Qualified

Surface Mount:

YES

Terminal Finish:

Tin (Sn)

Terminal Form:

NO LEAD

Terminal Position:

DUAL

Maximum Time At Peak Reflow Temperature (s):

40

Transistor Element Material:

SILICON

Trade Compliance

NTLGD3502NT2G Transistors trade compliance attributes, and parameters.

ECCN

EAR99

ECCN Governance

EAR

HTS

8541.29.00.95

SB

8541.29.00.80

PCN

Manufacturer Highlights

Onsemi

Established in 1999, Onsemi is a leading global provider of power and image-sensing technologies. They are dedicated to building a better future for the automotive, industrial, cloud, medical, and IoT markets. Onsemi's core technologies include analog, digital, and mixed-signal products that offer innovative solutions for advanced automotive systems; highly reliable power management products for industrial applications; low-cost imaging solutions for medical equipment and consumer electronics; and robust communication architectures for the Internet of Things (IoT).

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Management team

President, CEO

Hassane El-Khoury

Executive VP, CFO, Treasurer

Thad Trent

Senior VP

Ross F. Jatou

Manufacturer fab locations 15

Fab name Location Fab Initiation Wafer Capacity

Aizu Fab

Fabrication

Fab Initiation

1995

Japan

Aizu Wakamatsu

Wafer Capacity

52,000

1995

52,000

Si/EPI Fab

Fabrication

Fab Initiation

2018

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

10,000

2018

10,000

Expansion Phase 1 for SiC / EPI

Fabrication

Fab Initiation

2019

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

14,500

2019

14,500

Expansion Phase 2 for SiC / EPI

Fabrication

Fab Initiation

2024

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

2024

SiC Fab

Fabrication

Fab Initiation

2022

USA

Hudson

Wafer Capacity

2022

Bucheon

Fabrication

Fab Initiation

2013

South Korea

Bucheon

Wafer Capacity

61,000

2013

61,000

ISMF - Malaysia

Fabrication

Fab Initiation

1990

Malaysia

Seremban

Wafer Capacity

95,000

1990

95,000

Roznov Device Fab

Fabrication

Fab Initiation

1987

Czech Republic

Rožnov pod Radhoštěm

Wafer Capacity

80,000

1987

80,000

Fab 10

Fabrication

Fab Initiation

2002

USA

East Fishkill

Wafer Capacity

15,000

2002

15,000

Burlington

Fabrication

Fab Initiation

1986

Canada

Burlington

Wafer Capacity

1986

Gresham

Fabrication

Fab Initiation

1998

USA

Gresham

Wafer Capacity

45,000

1998

45,000

Bucheon 150mm

Fabrication

Fab Initiation

2000

South Korea

Bucheon

Wafer Capacity

50,000

2000

50,000

Rochester

Fabrication

Fab Initiation

1983

USA

Rochester

Wafer Capacity

10,000

1983

10,000

Nampa

Fabrication

Fab Initiation

1995

USA

Nampa

Wafer Capacity

1995

Pennsylvania

Fabrication

Fab Initiation

1997

USA

Mountain Top

Wafer Capacity

36,000

1997

36,000

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